2010
DOI: 10.1038/ncomms1143
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Atomically flat single-crystalline gold nanostructures for plasmonic nanocircuitry

Abstract: Deep subwavelength integration of high-definition plasmonic nanostructures is of key importance in the development of future optical nanocircuitry for high-speed communication, quantum computation and lab-on-a-chip applications. To date, the experimental realization of proposed extended plasmonic networks consisting of multiple functional elements remains challenging, mainly because of the multi-crystallinity of commonly used thermally evaporated gold layers. This can produce structural imperfections in indivi… Show more

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Cited by 398 publications
(472 citation statements)
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“…Irregularities, such as bigger crystal grains or possibly unknown particles on the multicrystalline gold film surface, can be observed, whereas very smooth surfaces are visible on the ITO-coated glass and single-crystalline gold flake. It is well known that evaporated multicrystalline gold films exhibit a typical diameter of crystal grains of 30-50 nm [49]. Atomic force microscope (AFM) imaging on the investigated gold film confirms a crystal grain size of 30-50 nm in our case.…”
Section: Resultssupporting
confidence: 75%
“…Irregularities, such as bigger crystal grains or possibly unknown particles on the multicrystalline gold film surface, can be observed, whereas very smooth surfaces are visible on the ITO-coated glass and single-crystalline gold flake. It is well known that evaporated multicrystalline gold films exhibit a typical diameter of crystal grains of 30-50 nm [49]. Atomic force microscope (AFM) imaging on the investigated gold film confirms a crystal grain size of 30-50 nm in our case.…”
Section: Resultssupporting
confidence: 75%
“…Recent publications report on the control of nanoscale roughness and its strong effect on the nanoparticles farand near-field optical properties. 9,10,12 However, varying surface roughness is often accompanied by varying crystallinity, and therefore the results do not allow for a clear distinction between the contributions of the surface and the bulk.…”
mentioning
confidence: 99%
“…These small features are difficult to achieve with nanosphere lithography; however, they could be potentially realized using planar fabrication techniques such as e-beam lithography 25 or ion tailored mask lithography 26 eventually combined with the use of a mono-crystalline gold film. 27 For a value of W neck ¼ 5 nm, whose fabrication feasibility has already been demonstrated, 26 we obtain V eff % 3 Â 10 À4 k 3 . For the more experimentally challenging case of W neck ¼ 2 nm, 25 we obtain V eff % 10 À5 k 3 .…”
mentioning
confidence: 85%