1993
DOI: 10.1007/bf00882542
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Atomic transport in layered polycrystalline films of Ni-Ag and Ni-Cu-Ag

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Cited by 4 publications
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“…Ni/Ag scheme is known as an immiscible system in solid state unless a very high temperature over 700°C is applied. 14,15 However, Ag has poor thermal stability under the annealing process so that holes would grow within Ag layer by surface diffusion of Ag atoms and, in time, the Ag layer would be agglomerated. 8,9,16 Figure 4 shows the morphology change of Ag layer of the ITO/Ni/Ag contact according to annealing condition.…”
Section: Resultsmentioning
confidence: 99%
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“…Ni/Ag scheme is known as an immiscible system in solid state unless a very high temperature over 700°C is applied. 14,15 However, Ag has poor thermal stability under the annealing process so that holes would grow within Ag layer by surface diffusion of Ag atoms and, in time, the Ag layer would be agglomerated. 8,9,16 Figure 4 shows the morphology change of Ag layer of the ITO/Ni/Ag contact according to annealing condition.…”
Section: Resultsmentioning
confidence: 99%
“…Figure 1 shows the I-V characteristics of as-deposited and annealed ITO/Ag-based p-contacts, respectively. 14,15 However, Ag has poor thermal stability under the annealing process so that holes would grow within Ag layer by surface diffusion of Ag atoms and, in time, the Ag layer would be agglomerated. The specific contact resistance measured from CTLM patterns was 1.3 ϫ 10 −5 , 5.4 ϫ 10 −5 , 7.6 ϫ 10 −5 , and 4.3 ϫ 10 −4 ⍀ cm 2 , respectively, for as-deposited ITO/Ag, ITO/Ni/Ag, ITO/Ni/Ag/Ni/Au, and ITO/Ni/Ag/W/Cu.…”
Section: Methodsmentioning
confidence: 99%