2021
DOI: 10.1021/acsmaterialsau.1c00039
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Atomic-Scale Modification of Oxidation Phenomena on the Ge(100) Surface by Si Alloying

Abstract: Properties of Ge oxides are significantly different from those of widely used Si oxides. For example, the instability of GeO x at device junctions causes electronic defect levels that degrade the performance of Ge-containing devices (e.g., transistors and infrared detectors). Therefore, the passivating Si layers have been commonly used at Ge interfaces to reduce the effects of Ge oxide instability and mimic the successful strategy of Si oxidation. To contribute to the atomic-scale knowledge and control of oxi… Show more

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Cited by 1 publication
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“…Several stabilization routes, adopted to control alarming Sn 2+ oxidization to the tetravalent state, are also anticipated to prevent Ge 2+ oxidization. The Ge‐interfaces are passivated by Si‐alloying while it strengthens the Ge‐O bonds hence controls the Ge 2+ oxidation 35 …”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Several stabilization routes, adopted to control alarming Sn 2+ oxidization to the tetravalent state, are also anticipated to prevent Ge 2+ oxidization. The Ge‐interfaces are passivated by Si‐alloying while it strengthens the Ge‐O bonds hence controls the Ge 2+ oxidation 35 …”
Section: Introductionmentioning
confidence: 99%
“…The Ge-interfaces are passivated by Si-alloying while it strengthens the Ge-O bonds hence controls the Ge 2+ oxidation. 35 Another effective stabilization scheme is by using mixed or double cation doping as recently Wang et al 36 have reduced 97.3% of Pb-content in CsPb 1Àx Ge x Br 3 perovskites with enhanced photovoltaic performance and phase stability. Ge-based perovskites 37 are currently less explored 38 but exhibit comparable photovoltaic properties with anionic conduction band and cationic valence band dominance.…”
Section: Introductionmentioning
confidence: 99%