2009
DOI: 10.1021/nl803196f
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Atomic-Scale, All Epitaxial In-Plane Gated Donor Quantum Dot in Silicon

Abstract: Nanoscale control of doping profiles in semiconductor devices is becoming of critical importance as channel length and pitch in metal oxide semiconductor field effect transistors (MOSFETs) continue to shrink toward a few nanometers. Scanning tunneling microscope (STM) directed self-assembly of dopants is currently the only proven method for fabricating atomically precise electronic devices in silicon. To date this technology has realized individual components of a complete device with a major obstacle being th… Show more

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Cited by 109 publications
(107 citation statements)
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“…Recently significant progress has been demonstrated in experimentally realizing electronic or optoelectronic device structures using single donors or defect centers [1][2][3][4][5][6][7][8][9]. Ion implantation is an industry standard for placing atoms in the near surface region with high precision, for example, for controlled source/drain junctions in silicon complementary metal oxide semiconductor (CMOS) applications.…”
Section: Introductionmentioning
confidence: 99%
“…Recently significant progress has been demonstrated in experimentally realizing electronic or optoelectronic device structures using single donors or defect centers [1][2][3][4][5][6][7][8][9]. Ion implantation is an industry standard for placing atoms in the near surface region with high precision, for example, for controlled source/drain junctions in silicon complementary metal oxide semiconductor (CMOS) applications.…”
Section: Introductionmentioning
confidence: 99%
“…Because of the random nature of dopant diffusion into the channel, we handpicked SATs suitable for our experiment. However, deterministic doping is rapidly emerging as technique that overcomes these kinds of device-to-device variability issues (1,3). Moreover, efforts towards room-temperature quantum effects have been demonstrated in ultrascaled FinFET devices, where the level spacing due to confinement is comparable to the thermal energy at room temperature (41).…”
Section: Methodsmentioning
confidence: 99%
“…There is therefore a world-wide intense research effort aiming at computing at the nano-scale, using both classical and quantum computing approaches (5)(6)(7)(8)(9)(10)(11)(12)(13)(14)(15)(16)(17). These advances are made possible by a complementary effort on building atomic devices and memory (3,(18)(19)(20)(21)(22)(23).…”
mentioning
confidence: 99%
“…The SET is operated with a 2.5 mV source-drain bias and has a charging energy of ∼5 meV. Further details of the fabrication methods have been published previously [30]. All data herein were taken inside a dilution refrigerator at 100 mK (electron temperature ∼200 mK).…”
mentioning
confidence: 99%