Here we report the growth of novel hybrid transition metal-organic thin-film materials consisting of manganese or cobalt as the metal component and terephthalate as the rigid organic backbone. The hybrid thin films are deposited by the currently strongly emerging atomic/molecular layer deposition (ALD/MLD) technique using the combination of metal β-diketonate, i.e. Mn(thd)3, Co(acac)3 or Co(thd)2, and terephthalic acid (1,4-benzenedicarboxylic acid) as precursors. All the processes yield homogeneous and notably smooth amorphous metal-terephthalate hybrid thin films with growth rates of 1-2 Å/cycle.The films are stable towards humidity and withstand high temperatures up to 300 or 400 °C under oxidative or reductive atmosphere, respectively. The films are characterized with XRR, AFM, GIXRD, XPS and FTIR techniques.