Atomic Layer Deposition of Nanostructured Materials 2011
DOI: 10.1002/9783527639915.ch12
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Atomic Layer Deposition on Soft Materials

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Cited by 18 publications
(25 citation statements)
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“…C) TEM image of a cellulose fibril coated by the atomic layer deposition with alumina and D) SEM image of sol–gel silica coating cellulose fiber. C) Adapted with permission . Copyright 2012, Wiley‐VCH.…”
Section: Coatingmentioning
confidence: 99%
“…C) TEM image of a cellulose fibril coated by the atomic layer deposition with alumina and D) SEM image of sol–gel silica coating cellulose fiber. C) Adapted with permission . Copyright 2012, Wiley‐VCH.…”
Section: Coatingmentioning
confidence: 99%
“…Unlike electrodeposition, 8,9 successive ionic layer adsorption and reaction, 10,11 and chemical bath deposition, 12,13 ALD is a gas phase process and so does not require a solvent, which can lead to swelling and/or degradation of the organic film. 14 ALD can also proceed at low temperatures ( 50 C) unlike other gas phase deposition methods, e.g., chemical vapor deposition (CVD), 15 and so is compatible with organic thin films. Finally, the thickness of the film can be precisely controlled, which is difficult in CVD and physical deposition processes.…”
Section: Introductionmentioning
confidence: 99%
“…17 Further, there is no requirement for a solvent which can cause swelling and/or degradation of the organic film. 15 Other advantages of ALD include large area uniformity, precise control of the deposited film thickness, and conformal deposition on 3D structures. 15,17,18 Atomic layer deposition processes have been employed on polymer surfaces to improve the mechanical stability of films, 19,20 to alter optical properties, 19 and to produce porous materials, membranes, nanotubes, and other structures.…”
Section: Introductionmentioning
confidence: 99%
“…15 Other advantages of ALD include large area uniformity, precise control of the deposited film thickness, and conformal deposition on 3D structures. 15,17,18 Atomic layer deposition processes have been employed on polymer surfaces to improve the mechanical stability of films, 19,20 to alter optical properties, 19 and to produce porous materials, membranes, nanotubes, and other structures. 21 In addition, the interaction of metal-containing ALD precursors with organic thin films, including polymers and SAMs, is of interest for lithography applications.…”
Section: Introductionmentioning
confidence: 99%