Atomic layer deposition of ZnO:Al on PAA substrates

Abstract

Abstract. In this work the ZnO:Al films of different thickness are grown on the Porous Anodic Alumina (PAA) and p-Si (100) substrates by Atomic Layer Deposition. The ZnO:Al films thicknesses are chosen appropriately in order to obtain complete filled pores as well as pores with a thin covering on the surface. The obtained structures are investigated with spectroscopic ellipsometry and Scanning Electron Microscopy (SEM) techniques.

Effects of Anodic Aluminum Oxide Substrate Pore Geometry on the Gas-Phase Photocatalytic Activity of ZnO/Al2O3 Composites Prepared by Atomic Layer Deposition

“…A total of 50 ALD cycles (DEZ/purging/H 2 O/purging) were repeated to obtain a ZnO layer with a thickness of about 8 nm, confirmed by ellipsometry on reference Si substrates placed in the ALD reactor. Using this procedure, a conformal ZnO coverage can be achieved with a coverage up to several micrometers within the AAO pores, as confirmed in our previous study [10].…”

“…These observations can be explained through diffusion limitations in the narrower pore structure [21,22]. Assuming that the ZnO coverage is reasonably uniform within the pores, as shown in our previous study [10], improving reactant diffusion and light penetration would lead to a higher number of catalytic sites utilized and hence a higher photocatalytic activity. However, any further increase in pore diameter is expected to have a detrimental effect on PCO rates due to the decrease in effective surface area (reducing the number of active sites).…”

ALD Deposited ZnO:Al Films on Mica for Flexible PDLC Devices

“…Woollam and Co., Lincoln, NE, USA). The film thickness and the optical constants were determined by fitting the experimental Ψ and Δ data [ 30 ].…”