2006
DOI: 10.1063/1.2245216
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Atomic layer deposition of W on nanoporous carbon aerogels

Abstract: In this study, the authors demonstrate the ability to apply precise, conformal W coatings onto all surfaces of nanoporous carbon aerogels using atomic layer deposition (ALD). The resulting material has a filamentous structure in which the W completely encapsulates the carbon aerogel strands. The material mass increases nonlinearly with W coating, achieving a tenfold increase following ten ALD cycles. The aerogel surface area increases by nearly a factor of 2 after ten W ALD cycles. This conformal metal coating… Show more

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Cited by 57 publications
(68 citation statements)
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“…This model is consistent with mass initially increasing with the square of the ALD film thickness, and subsequently becoming constant, as we have previously observed. [14,20] In fact, the absorbance decreased monotonically for the electrodes coated with ZnO layer thicknesses larger than 2.1 nm indicating that the usable surface area was decreasing, presumably due to pore filling (Table 1). Alternatively, since the porosity decreases with increasing ZnO thickness, poor diffusion of the dye throughout the aerogel membrane may be responsible for the decrease of dye loading with more ZnO.…”
mentioning
confidence: 92%
“…This model is consistent with mass initially increasing with the square of the ALD film thickness, and subsequently becoming constant, as we have previously observed. [14,20] In fact, the absorbance decreased monotonically for the electrodes coated with ZnO layer thicknesses larger than 2.1 nm indicating that the usable surface area was decreasing, presumably due to pore filling (Table 1). Alternatively, since the porosity decreases with increasing ZnO thickness, poor diffusion of the dye throughout the aerogel membrane may be responsible for the decrease of dye loading with more ZnO.…”
mentioning
confidence: 92%
“…Therefore it is an ideal tool to coat uniformly polymer and carbon aerogels. By now, there have been several ALD depositions of semiconductor oxides on carbon substrates [3,31], however; there have been only a few metal and semiconductor oxide depositions on aerogels [32][33][34][35], and these composites were not used as photocatalysts, to the best of our knowledge.Hence, our aim was to prepare polymer and carbon aerogel/TiO2 composites from resorcinolformaldehyde aerogel (RFA) and its carbon aerogel (RFCA) derivative by ALD. The RF hydrogel was prepared by sol-gel method from resorcinol and formaldehyde.…”
mentioning
confidence: 99%
“…A 2-4 lL drop of the suspension was deposited onto a clean silicon substrate and evaporated with a heat lamp. To fill open pore space and stabilize the samples, atomic layer deposition (ALD; Elam et al 2006) was performed at Argonne National Laboratory to deposit Al 2 O 3 (approximately 3.6 nm thickness) and tungsten (approximately 1.3 nm thickness) onto the tips. We also prepared control samples that consisted only of deposited Al 2 O 3 .…”
Section: Chicago Methodsmentioning
confidence: 99%