Our system is currently under heavy load due to increased usage. We're actively working on upgrades to improve performance. Thank you for your patience.
2013
DOI: 10.1002/cvde.201307054
|View full text |Cite
|
Sign up to set email alerts
|

Atomic Layer Deposition of W:Al2O3 Nanocomposite Films with Tunable Resistivity

Abstract: Nanocomposite tungsten-aluminum oxide (W:Al 2 O 3 ) thin films were prepared by atomic layer deposition (ALD) using tungsten hexafluoride (WF 6 ) and disilane (Si 2 H 6 ) for the W ALD and trimethyl aluminum (TMA) and H 2 O for the Al 2 O 3 ALD. Quartz crystal microbalance (QCM) measurements performed using various W cycle percentages revealed that the W ALD inhibits the Al 2 O 3 ALD and vice versa. Despite this inhibition, the relationship between W content and W cycle percentage was close to that predicted b… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

5
36
0

Year Published

2015
2015
2024
2024

Publication Types

Select...
9
1

Relationship

2
8

Authors

Journals

citations
Cited by 37 publications
(41 citation statements)
references
References 46 publications
(55 reference statements)
5
36
0
Order By: Relevance
“…The anode readout strips extend through the side wall from vacuum to air. As the key element, the MCPs are made of microchannel glass substrates [15] [27] coated by ALD [16][17] [18] , featuring 20 m pores and a length-to-diameter (L/D) ratio of 60. The open area ratio is about 60%.…”
Section: Stack Componentsmentioning
confidence: 99%
“…The anode readout strips extend through the side wall from vacuum to air. As the key element, the MCPs are made of microchannel glass substrates [15] [27] coated by ALD [16][17] [18] , featuring 20 m pores and a length-to-diameter (L/D) ratio of 60. The open area ratio is about 60%.…”
Section: Stack Componentsmentioning
confidence: 99%
“…A key advantage of ALD is its ability to coat small pores with high L/d ratios. Nanocomposite ALD resistive coatings have been developed that meet all of the requirements for large area MCPs [5,6].…”
Section: Ald Coated Mcpsmentioning
confidence: 99%
“…Instead of H-firing to achieve the functional MCP coating, the capillary array plates are functionalized by applying resistive and emissive coatings via an atomic layer deposition (ALD) process [2]. ALD is a thin film coating method that utilizes alternating exposures of gaseous chemical precursors and a solid surface to deposit materials in an atomic layer-by-layer fashion.…”
Section: Atomic Layer Deposition Coatingmentioning
confidence: 99%