Atomic layer deposition of TiO2 from TiCl4 and O3

Aarik, Lauri; Arroval, Tõnis; Rammula, Raul; Mändar, Hugo; Sammelselg, Väinö; Aarik, Jaan

doi:10.1016/j.tsf.2013.06.074

Cited by 66 publications

(47 citation statements)

References 49 publications

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“…an increasing number of cycles, and thus film thickness, was associated with a slight increase in surface roughness. Similar results were obtained, the morphology of TiO 2 film deposited onto a Si substrate using the atomic layer deposition method was investigated, at similar parameters of the process [29]. They also observed that an increase in surface roughness was related to greater film thickness.…”

Section: Resultssupporting

confidence: 76%

Mechanical properties of atomic layer deposition (ALD) TiO₂ layers on stainless steel substrates

Basiaga

Staszuk

Walke

et al. 2016

Materialwissenschaft Werkst

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Surface modification techniques play a major role in shaping the physicochemical properties of 316 LVM steel used for implants. The utilised methods of surface layer modification must ensure repeatability and uniformity of the physical and chemical properties. The structure and chemical composition of 316 LVM steel implants can be modified using various methods, among which anode oxidation and sol-gel methods are dominant. One of the more important aspects related to maintaining implants (e.g. vessel stents) is ensuring the maintenance of their geometric characteristics along their entire length, which some methods cannot guarantee. For this reason, the most appropriate technique of surface modification in this context appears to involve atomic layer deposition (ALD). Improved biocompatibility is also directly related to ensuring an appropriate set of mechanical properties for the deposited layer. Thus, the study attempted to assess the mechanical properties of the TiO 2 layers on a 316 LVM steel substrate, deposited using an atomic layer depositionbased method.Keywords: 316 LVM / TiO 2 / atomic layer deposition / scratch test / nanohardness / ellipsometry / atomic force microscopy (AFM)Oberflächenmodifizierungstechniken spielen eine wichtige Rolle bei der Gestaltung der physikalisch-chemischen Eigenschaften von 316 LVM Stahl für Implantate. Die eingesetzten Methoden der Oberflächenschichtmodifikation müssen Wiederholbarkeit und Einheitlichkeit der physikalischen und chemischen Eigenschaften sicherstellen. Die Struktur und die chemische Zusammensetzung des 316 LVM Stahlimplantats können durch verschiedene Verfahren, unter anderem durch Anodenoxidation und Sol-Gel-Verfahren, signifikant modifiziert werden. Einer der wichtigsten Aspekte zur Aufrechterhaltung der Funktionalität von Implantaten (z. B. Gefäß-prothesen) ist der Erhalt ihrer geometrischen Eigenschaften entlang der gesamten Länge, die einige der Methoden nicht garantieren können. Aus diesem Grund scheint die geeignetste Technik der Oberflächenmodifikation auf der Atomlagenabscheidung (ALD) zu basieren. Verbesserte Biokompatibilität ist auch in direktem Zusammenhang mit der Gewährleistung angemessener mechanischer Eigenschaften der abgeschiedenen Schicht zu sehen. Somit versucht diese Studie, die

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Section: Resultssupporting

confidence: 76%

Mechanical properties of atomic layer deposition (ALD) TiO₂ layers on stainless steel substrates

Basiaga

Staszuk

Walke

et al. 2016

Materialwissenschaft Werkst

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“…In the process of growth of metal oxides, in which H 2 O is used as an oxygen precursor, hydroxyl groups can be formed on the surface of substrate during the oxygen precursor pulse. Thus, the adsorbed metal precursor may react with surface hydroxyl groups and release some ligands in this reaction [14,15].…”

Section: Introductionmentioning

confidence: 99%

Structure and optical properties of TiO₂ thin films deposited by ALD method

2017

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This paper presents the results of study on titanium dioxide thin films prepared by atomic layer deposition method on a silicon substrate. The changes of surface morphology have been observed in topographic images performed with the atomic force microscope (AFM) and scanning electron microscope (SEM). Obtained roughness parameters have been calculated with XEI Park Systems software. Qualitative studies of chemical composition were also performed using the energy dispersive spectrometer (EDS). The structure of titanium dioxide was investigated by X-ray crystallography. A variety of crystalline TiO 2 was also confirmed by using the Raman spectrometer. The optical reflection spectra have been measured with UV-Vis spectrophotometry.

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“…ZrO 2 films have been grown by several water-free ALD processes [21], such as in those based on (C 5 H 5 )Zr(N(CH 3 ) 2 ) 3 and oxygen plasma [7,22], Zr[N(CH 3 ) 2 ] 4 and O 3 [14], Zr[N(CH 3 )(C 2 H 5 )] 4 and O 3 [6,9,11,23], Cp 2 ZrCl 2 and O 3 [13,24], or Zr(NEtMe) 3 (guanNEtMe) and O 3 [25]. Regarding metal halide based and hydrogen-free ALD processes, depositions of Al 2 O 3 from AlCl 3 and O 3 [26], TiO 2 from TiCl 4 and O 3 [27], Ta 2 O 5 from TaCl 5 and O 3 [28], HfO 2 from HfCl 4 and O 3 [29], and HfO 2 from HfI 4 and O 2 [30] have been reported. There is also an implication about the possibility to atomic layer deposition of [29], although the details of the process have remained beyond the scope of that study.…”

Section: Introductionmentioning

confidence: 99%

Atomic layer deposition of zirconium dioxide from zirconium tetrachloride and ozone

et al. 2015

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Atomic layer deposition of TiO2 from TiCl4 and O3

Cited by 66 publications

References 49 publications

Mechanical properties of atomic layer deposition (ALD) TiO₂ layers on stainless steel substrates

Mechanical properties of atomic layer deposition (ALD) TiO₂ layers on stainless steel substrates

Structure and optical properties of TiO₂ thin films deposited by ALD method

Atomic layer deposition of zirconium dioxide from zirconium tetrachloride and ozone

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Atomic layer deposition of TiO2 from TiCl4 and O3

Cited by 66 publications

References 49 publications

Mechanical properties of atomic layer deposition (ALD) TiO2 layers on stainless steel substrates

Mechanical properties of atomic layer deposition (ALD) TiO2 layers on stainless steel substrates

Structure and optical properties of TiO2 thin films deposited by ALD method

Atomic layer deposition of zirconium dioxide from zirconium tetrachloride and ozone

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Mechanical properties of atomic layer deposition (ALD) TiO₂ layers on stainless steel substrates

Mechanical properties of atomic layer deposition (ALD) TiO₂ layers on stainless steel substrates

Structure and optical properties of TiO₂ thin films deposited by ALD method