2010
DOI: 10.1016/j.snb.2010.05.018
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Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors

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Cited by 26 publications
(11 citation statements)
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“…[1,2] The purpose of these sensors is the detection of gases such as O 3 , NO x , CO, NH 3 , C 2 H 5 OH, ... and the measurement of their concentration in the atmosphere. The sensitive layer of the sensor device consists in n-type semiconductors MOx such as WO 3 , SnO 2 , ZnO, TiO... [3][4][5][6][7][8][9][10][11][12][13][14][15][16][17] or p-type ones such as CuO, Cu 2 O, Cr…”
Section: Introductionmentioning
confidence: 99%
“…[1,2] The purpose of these sensors is the detection of gases such as O 3 , NO x , CO, NH 3 , C 2 H 5 OH, ... and the measurement of their concentration in the atmosphere. The sensitive layer of the sensor device consists in n-type semiconductors MOx such as WO 3 , SnO 2 , ZnO, TiO... [3][4][5][6][7][8][9][10][11][12][13][14][15][16][17] or p-type ones such as CuO, Cu 2 O, Cr…”
Section: Introductionmentioning
confidence: 99%
“…10(b). Niskanen et al [143] used ALD to produce gassensitive tin dioxide film in a microhotplate gas sensor. Ethanol, acetone, and acrylonitrile were used as model analytes to investigate the device performance.…”
Section: Applications Of Ald In Other Sensorsmentioning
confidence: 99%
“…The film displays a higher conductivity due to the high concentration of oxygen vacancies and a higher sensitivity to CO compared to films grown from SnCl 4 . Polycrystalline films of SnO 2 deposited from SnCl 4 and water at 500 °C showed also to be sensitive to volatile organic compounds such as ethanol, acetone and acrylonitrile . A plasma enhanced ALD process was developed starting from dibutyl tin diacetate and oxygen plasma.…”
Section: Thin Films As Gas Sensorsmentioning
confidence: 99%