Atomic layer deposition of MgO films on yttria-stabilized zirconia microtubes

High photocatalytic capacity of porous ceramic-based powder doped with MgO

“…Moreover, it is the most used methods to obtain solid solutions based on the reaction of a mixture of oxides inside an agate vessel using automatic crushing. [19][20][21]. This technique is mainly based on the easy and short time of the fabrication process and the use of less expensive compounds.…”

“…MgO is one of the semiconductors selected in the study based on its mechanical, electrical, optical and thermal properties that make it a good catalyst for various applications [17][18][19]. Over the past decades, this material has showed great scientific and technological advantages due to its high thermal stability (up to 2900 °C), low wear resistance, dielectric (dielectric constant 9.8) and large impermeable range (Eg = 7.2 V) [20][21][22]. Recent studies have also shown that the size and shape of the magnesium oxide nanoparticles give it a high-quality surface as a reaction catalyst, due to structural defects on the surface.…”

“…It is suitable for water decomposition and hydrogen production [16,19,22]. MgO is also used for special wideranging biological roles including groundwater, wastewater, drinking water, air emissions and toxic waste treatment, as well as potentially as an antimicrobial agent [16,21,[23][24][25].…”

Advances in Deposition of Main‐Group Metal Oxides and Rare‐Earth Oxides from Metal Enolates

“…Especially, the CVD and ALD processes require metal-organic precursors, which are volatile and thermally stable, and decompose at moderate temperatures. Group 2 metal oxides are of importance as protective coatings of dielectrics, buffer layers for superconductors, solid electrolyte materials in fuel cells, and as catalysts in the generation of hydrogen from water 14 . Because of their remarkable electrooptic properties, Group 2 metal titanates find application in the field of integrated photonic devices 15 .…”

“…Energy dispersive X-ray spectroscopy (EDX) microanalysis (accelerating voltage 5, 10, 20 kV) indicated MgO formation with a relatively high carbon content, which most probably stemmed from the precursor. The respective MgO-coated YSZ microtubes are used in plasma jet devices 14 A possibility for metal fluoride film formation of Mg, Ca, and La is ALD at 300 ∘ C using fluorinated metal precursors, such as [Ca(hfac) 2 ], of which hfac is the fluorine source and O 3 the oxygen source 22 . Ozone is therefore responsible for the activation of hfac, which is adsorbed on the substrate surface.…”