2012
DOI: 10.1016/j.jcrysgro.2011.09.062
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Atomic layer deposition of ferromagnetic iron oxide films on three-dimensional substrates with tin oxide nanoparticles

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Cited by 28 publications
(31 citation statements)
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“…In the growth experiments we used ferrocene as the iron precursor, which is widely used in the growth of binary and ternary oxides . However, long exposure and incubation times are required to achieve a saturated growth . Triphenyl‐bismuth was used as the second component for the BFO growth.…”
Section: Resultsmentioning
confidence: 99%
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“…In the growth experiments we used ferrocene as the iron precursor, which is widely used in the growth of binary and ternary oxides . However, long exposure and incubation times are required to achieve a saturated growth . Triphenyl‐bismuth was used as the second component for the BFO growth.…”
Section: Resultsmentioning
confidence: 99%
“…[9,17,20] However,l ong exposure and incubation times are required to achieve as aturatedg rowth. [28,29] Triphenyl-bismuth was used as the second component for the BFO growth. This precursorw as already tried in the growth of Bi 2 Ti 2 O 7 films, but proved to be unfavorable when oxidized by H 2 O 2 due to the inability to produce pure Bi 2 O 3 films and difficulty in reaching ar atio of Bi/Ti = 1.…”
mentioning
confidence: 99%
“…Each cycle is characterized by a timing-sequence of t 1 -t 2 -t 3 -t 4 such that t 1 and t 3 correspond to the first and the second precursor exposure times, and t 2 and t 4 represent the first and the second purge times, respectively [9,10]. Since the same deposition thickness is obtained at the end of each cycle, the desired film thickness can be controlled precisely by the number of ALD cycles.…”
Section: Introductionmentioning
confidence: 99%
“…The hematite -Fe 2 O 3 with bandgap 2.2 eV has been considered as a potential candidate due to its low cost, chemical stability, widespread availability and high absorbance. 6 The various methods have been used to deposit the iron oxide thin films, including sol-gel deposition 7 spray pyrolysis, 8 chemical vapor deposition, 9 atomic layer deposition 10 and electrodeposition method. 11 Among these methods, the spray pyrolysis has many advantages as simplicity, low cost and large area depositions 12 Article and easily adjusting the various deposition parameters to prepare homogeneous thin films using various spray solutions.…”
Section: Introductionmentioning
confidence: 99%