Atomic layer deposition (ALD) as a coating tool for reinforcing fibers

Roy, Amit; Baumann, Wolfgang; König, I.; Baumann, Gisela; Schulze, Steffen; Hietschold, Michael; Mader, Thomas F.; Nestler, Daisy; Wielage, B.; Goedel, Werner A.

doi:10.1007/s00216-010-3470-9

Cited by 27 publications

(18 citation statements)

References 32 publications

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“…The coating is efficient in slowing down the oxidation of carbon fibers. In our early studies, alumina coating was deposited using aluminum chloride and water as precursors 44,45 . This deposition process was also successful; however, it was difficult to control the aluminum chloride precursor dose due to the solid nature of the aluminum chloride.…”

Section: Discussionmentioning

confidence: 99%

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Atomic Layer Deposition of Alumina onto Carbon Fibers

Roy

Baumann

Schulze

et al. 2011

Journal of the American Ceramic Society

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Bundles of carbon fibers were successfully coated with alumina by atomic layer deposition via sequential exposures to trimethylaluminum and water at 77°C. Fibers were not damaged by this procedure. Scanning electron microscopy (SEM) images revealed that individual filaments were coated separately with a smooth layer; no bridging of fibers was observed. Transmission electron microscopy (TEM) and SEM images indicate that the coating was conformal and adhered well to the fiber surface. The average deposition rate was 0.25±0.02 nm/cycle, calculated from SEM images obtained at various positions of the fibers and of fibers coated with various numbers of cycles. In addition to image analysis, the coating thickness was as well estimated from the elemental composition of selected parts of a fiber bundle that was coated by 450 cycles. Along the fiber axis, the weight fraction of aluminum of the coated fibers varied from 5.3 to 6.5 wt% and perpendicular to the bundle axis it varied from 4.8 to 7.4 wt%. This translates into a variation of the estimated coating thickness along the fiber from 166 to 126 nm and perpendicular to it from 114 to 183 nm. One can estimate independently an average coating thickness from the analysis of SEM images of this specific bundle of 126 nm. The alumina coating improved oxidation resistance of the carbon fiber significantly. The oxidation onset temperature was 600°C for fibers coated with a 30‐nm‐thick layer of alumina and increased gradually with increasing coating thickness up to 660°C at a thickness of 120 nm. On the other hand, uncoated fibers started to oxidize already at 300°C.

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Section: Discussionmentioning

confidence: 99%

“…Alumina often is deposited via ALD using water and trimethylaluminum as precursors 30,33,35,41,42 . Thus, in this article, we apply ALD to coat carbon fiber bundles with alumina using trimethylaluminum and water as precursors extending a first report of the idea 44,45 …”

Section: Introductionmentioning

confidence: 99%

Atomic Layer Deposition of Alumina onto Carbon Fibers

Roy

Baumann

Schulze

et al. 2011

Journal of the American Ceramic Society

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“…Thin alumina coatings were deposited, using a 'home built' ALD reactor, 16 . Except for freshly cut ends, there are almost no regions where the coating is damaged; thus there seems to be good adhesion of the coating to the surface.…”

Section: A Coating By Layers Made Out Of a Single Materialsmentioning

confidence: 99%

“…Until recently, atomic layer deposition almost exclusively was used in the microelectronic industry on comparatively flat substrates, but in the last decade, its use was expanded into general material science, e.g. 16 The purpose of this contribution here is to highlight the recent developments in a comparative manner. 16,17 The principle of the ALD deposition onto fibers, where as an example, alumina is deposited using trimethylaluminum and water as precursors onto a surface already bearing hydroxyl groups was explained in details before.…”

Section: Introductionmentioning

confidence: 99%

Atomic layer deposition onto carbon fiber: From single layer deposition via multilayer structure to metal oxide microtubes

Knohl

Roy

Goedel

et al. 2012

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Articles you may be interested inAtomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors J. Vac. Sci. Technol. B 32, 060602 (2014); 10.1116/1.4897919 Improved oxidation resistance of organic/inorganic composite atomic layer deposition coated cellulose nanocrystal aerogels Surface modification of nitrogen-doped carbon nanotubes by ozone via atomic layer deposition J. Vac. Sci. Technol. A 32, 01A124 (2014); 10.1116/1.4847995Engineering titanium and aluminum oxide composites using atomic layer deposition Layers of alumina, titania and double layers of alumina/titania (and reverse) were deposited onto bundles of carbon fibers in an atomic layer deposition process. Scanning electron microscopy (SEM) images of the coated carbon fibers revealed that each fiber of a bundle was coated homogenously and separately and that no bridges were formed between the fibers. Transmission electron microscopy and SEM images showed that the coating was conformal, uniform, had a good adhesion to the fiber surface and that the morphology of the coating surface was similar to that of fiber surface. In case of double layers, the average deposition rate of coatings did not depend on the sequence of layer deposition. After coating, the carbon fibers were selectively removed by thermal oxidation in air at temperatures of 550 C and 900 C, leading to metal oxide microtubes.

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“…Water and trimethylaluminum are commonly used as precursors in the deposition of Al 2 O 3 by using atomic layer deposition [26,27]. Al 2 O 3 is one of the most attractive and extensively studied materials by ALD [4,18,26], because of its chemical and thermal stability, and good adhesion to the various materials [28].…”

Section: B Reaction Mechanismmentioning

confidence: 99%

A Review of Atomic Layer Deposition for Nanoscale Devices

Riyanto

Rijanto

Prawara

2012

J. Mechatron. Electr. Power Veh. Technol.

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Atomic layer deposition (ALD) is a thin film growth technique that utilizes alternating, self-saturation chemical reactions between gaseous precursors to achieve a deposited nanoscale layers. It has recently become a subject of great interest for ultrathin film deposition in many various applications such as microelectronics, photovoltaic, dynamic random access memory (DRAM), and microelectromechanic system (MEMS). By using ALD, the conformability and extreme uniformity of layers can be achieved in low temperature process. It facilitates to be deposited onto the surface in many variety substrates that have low melting temperature. Eventually it has advantages on the contribution to the wider nanodevices.Key words: thin coating, atomic layer deposition, nanoscale devices. Abstrak Atomic layer deposition (ALD) adalah teknik penumbuhan lapisan tipis yang menggunakan reaksi kimia jenuh antara gas pendahulu untuk mendapatkan deposisi lapisan skala nano. Teknik ini menjadi subyek yang sangat menarik saat ini untuk deposisi lapisan sangat tipis pada berbagai aplikasi seperti mikroelektronik, photovoltaic, dynamic random access memory (DRAM) dan sistem mikroelektromekanik (MEMS

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Atomic layer deposition (ALD) as a coating tool for reinforcing fibers

Cited by 27 publications

References 32 publications

Atomic Layer Deposition of Alumina onto Carbon Fibers

Atomic Layer Deposition of Alumina onto Carbon Fibers

Atomic layer deposition onto carbon fiber: From single layer deposition via multilayer structure to metal oxide microtubes

A Review of Atomic Layer Deposition for Nanoscale Devices

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