record 9.5% efficiency pure sulfide CZTS solar cell, [4] but it is still much lower than the S-Q limit and its CuInGaSe 2 (CIGS) counterpart. It has been identified that the main reason for the efficiency limitation is the open-circuit voltage (V oc ) deficit (E g /q −V oc , where q is the elemental charge) as a result of band fluctuation and nonradiative recombination. [5] In addition, unfavorable conduction band alignment, i.e., cliff-like conduction band offset, at the interface of CZTS absorber/ CdS has been reported to lead to high recombination, contributing to the loss of V oc . [6] The majority of electron-hole pairs are generated near the CZTS/CdS interface, [7] so the passivation of the CZTS/ CdS interface is of crucial importance in achieving high-performance CZTS solar cells. In CIGS solar cells, Al 2 O 3 was employed for better surface passivation. [8] In these papers, both field effect passivation by fixed negative charge and chemical passivation play a role in passivating the CIGS surface, and decrease surface recombination velocity. The thickness of Al 2 O 3 used in these studies is few tens of nanometers which are not suitable for the heterojunction passivation as such a thick layer would impede carrier flow at the junction area.We employed an ultrathin atomic layer deposited (ALD)-Al 2 O 3 layer, which is believed to effectively reduce interfacial recombination by reacting with the surface defects. [8a] It is known that, in ALD process, the precursor molecule and the reactant which are trimethylaluminum (TMA, Al(CH 4 ) 3 ) and H 2 O respectively, [9,10] are the hydrogen sources needed for chemical passivation. The passivation mechanism of ALD-Al 2 O 3 in the silicon solar cells can be divided into two categories: i) field effect passivation induced by negative fixed charges [11] and ii) chemical passivation by hydrogen. [12] For field effect passivation, it has been reported that a critical thickness is required to ensure this field effect. [13] Based on the benefits of ALD-Al 2 O 3 , the kesterite group at IBM has recently reported the passivation of CZTSSe/CdS interface by a thin ALD-Al 2 O 3 layer (less than 1 nm) showing enhanced performance due to surface passivation effects. [14] However, the detailed passivation route is unknown. The effect of ultrathin (less than 1 nm) Al 2 O 3 on interface passivation is unclear as negative fixed charges may not be involved in the passivation effect.