Atmospheric pressure plasma functionalization of carbon nanotube dot-array with two-stage plasma treatments for the development of bio-chip sensors

Amino-grafting pre-functionalization of terephthalic acid by impulse dielectric-barrier discharge (DBD) plasma for amino-based Metal-Organic Frameworks (MOFs)

“…The dry plasma processes used for the elaboration and functionalization of materials are varied. In fact, they differ according to the gas pressure, ranging from low pressure processes (a few Pa to 100 Pa) [48,54,[62][63][64] to atmospheric pressure processes [49,51,[55][56][57]65]. Low-pressure plasma processes are highly non-equilibrium thermodynamics means with high electron temperatures that can reach a few tens of electron-volts and a low degree of ionization [66].…”