Atmospheric Pressure Plasma Discharge for Polysiloxane Thin Films Deposition and Comparison with Low Pressure Process

Abstract

An atmospheric pressure dielectric barrier plasma discharge has been used to study a thin film deposition process. The DBD device is enclosed in a vacuum chamber and one of the electrodes is a rotating cylinder. Thus, this device is able to simulate continuous processing in arbitrary deposition condition of pressure and atmosphere composition. A deposition process of thin organosilicon films has been studied reproducing a nitrogen atmosphere with small admixtures of hexamethyldisiloxane (HMDSO) vapours. The plasma discharge has been characterized with optical emission spectroscopy and voltagecurrent measurements. Thin films chemical composition and morphology have been characterized with FTIR spectroscopy, atomic force microscopy (AFM) and contact angle measurements. A strong dependency of deposit character from the HMDSO concentration has been found and then compared with the same dependency of a typical low pressure plasma enhanced chemical vapour deposition process.

Plasma Polymer Deposition and Coatings on Polymers

“…In Figure 31, the deposition rates of HMDSO discharges within two different LP reactors (with a deposition area of 180 and 1500 cm 2 ) using a monomer gas flow of 4 and 28 sccm are depicted. AP conditions found comprise DBDs with 1-4 sccm HMDSO (in 10 slm He), 15 cm in diameter, and with 1-24 sccm HMDSO (in 2 slm N 2 ) using a 23 cm long rod and a rotating ground electrode (34,114). This is caused by different eedfs and incorporation rates as discussed earlier (14,67).…”

Development of nano-structured icephobic surfaces based on plasma polymerization /

“…At the same time, it led to a decrease in desired groups. Many studies showed the effect of plasma polymerization power on the contact angle of the resulting coating [85,86].…”

“…Siliprandi et al [85] showed the decrease of the degree of polymerization and formation implies growth in itself (oligomer-like layer) at low input power. As well, the smooth structure was deposited in ultra-low fragmentation conditions.…”

Characterization of atmospheric pressure plasma treated pure cashmere and wool/cashmere textiles: Treatment in air/water vapor mixture

“…In the last years, atmospheric pressure plasma treatments have gained considerable popularity for the surface modification of materials [1,[26][27][28]. The main advantages over the low-pressure ones are the possibility to avoid the expensive vacuum systems, to decrease the time of treatment, and to simplify the technological transfer where the processes of production are making in continuous mode.…”