Atmospheric-pressure plasma CVD of TiO<sub>2</sub>photocatalytic films using surface dielectric barrier discharge

Di, Lanbo; Li, Xiaosong; Shi, Chuan; Xu, Yong; Zhao, Dan; Zhu, Ai‐Min

doi:10.1088/0022-3727/42/3/032001

Cited by 42 publications

(34 citation statements)

References 21 publications

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“…Therefore, if pure anatase TiO 2 phase with high thermal stability were synthesized, many more applications using anatase TiO 2 would be realized. TiO 2 thin films have been fabricated by many different physical and chemical deposition methods [14,15] [16,17]. The metal-organic precursors, which are used extensively in the thermal ALD process (ozone-or water-based), often produce the critical problems of high impurity content and low film density due to insufficient reactivity with reactants.…”

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confidence: 99%

Deposition temperature dependence of titanium oxide thin films grown by remote‐plasma atomic layer deposition

Lee

Han

et al. 2012

Physica Status Solidi (a)

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Titanium dioxide (TiO 2 ) thin films were deposited by remoteplasma atomic layer deposition (RPALD). The process window was determined in the range from 150 to 300 8C for atomic layer deposition of TiO 2 thin film. The crystal structure and grain size of the TiO 2 thin films deposited by RPALD was controlled via the variations of the deposition temperature and post-deposition thermal annealing. The as-deposited TiO 2 thin film grown at 150 8C was amorphous whereas the TiO 2 thin films grown above 200 8C were polycrystalline, consisting of anatase phase. As the deposition temperature increased, the grain size of the anatase phase progressively decreased. Meanwhile, when annealed at 900 8C, the amorphous TiO 2 thin film deposited at 150 8C crystallized into anatase structure. The film deposited at 200 8C retained the anatase structure up to 900 8C while incurring minimal grain growth. However, the post-annealed TiO 2 thin films deposited at 250 and 300 8C partially transformed to the rutile structure, resulting in a mixture of anatase and rutile phases. It is speculated that the relatively large grain size of the films deposited below 200 8C likely suppressed the anatase ! rutile transformation during annealing as the reduction of total fraction of grains boundaries, which acted as primary nucleation sites for the rutile transition, delayed the anatase ! rutile transformation.

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confidence: 99%

Deposition temperature dependence of titanium oxide thin films grown by remote‐plasma atomic layer deposition

Lee

Han

et al. 2012

Physica Status Solidi (a)

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“…Photocatalytic oxidation (PCO) of CO was conducted to evaluate photocatalytic activity of Au/TiO 2 photocatalysts in a single‐pass continuous‐flow reactor . The reactor was maintained at 25 ± 1.5 °C by the circulating water.…”

Section: Methodsmentioning

confidence: 99%

Effect of ammonia‐derived species on visible‐light photocatalytic activity of Au supported on amorphous TiO₂ activated by plasma

Sun

Liu

et al. 2018

Plasma Processes & Polymers

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Amorphous TiO 2 supported Au photocatalyst (Au/AmT) is prepared via modified impregnation method with ammonia washing, followed by cold plasma treatment to activate the photocatalysts. Residual ammonia ([NH 3 ] s ) is formed due to the hydrogen bond between surface OH groups on AmT and ammonia. The [NH 3 ] s suppressed the reduction of Au δ+ and occupied active sites, leading to a poor activity of as-prepared Au/AmT. The performance of cold plasmas in activation strongly depends on discharge gases. N 2 and O 2 plasmas not only cannot reduce Au δ+ into Au 0 but also convert [NH 3 ] s into poisoning species [NO y ] s during activation. H 2 plasma with a strong reducibility can simultaneously reduce Au δ+ and remove [NH 3 ] s , thus enabling Au/AmT to achieve the highest visiblelight photocatalytic activity in CO oxidation. K E Y W O R D S amorphous TiO 2 , Au/TiO 2 photocatalyst, cold plasma, plasma activation, surface plasmon resonance Plasma Process Polym. 2018;15:e1800095. www.plasma-polymers.com

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“…So it can deposit TiO 2 films on the substrates without the limitation to the sizes and complexity of geometries. The results of structural analysis had showed that the TiO 2 films were amorphous structure or low crystallinity . Meantime, the TiO 2 films have the wide band gap.…”

Section: Introductionmentioning

confidence: 99%

A new method for deposition nitrogen-doped TiO2 nanofibers with mixed phases of anatase and rutile

Yuan

Yin

et al. 2017

Surf Interface Anal

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A new method for deposition nitrogen-doped TiO 2 nanofibers films was proposed. By using atmospheric pressure plasma jet generated by dual-frequency power sources, the morphologies of these TiO 2 films were investigated by scanning electron microscopy. The structures of these films were characterized by X-ray diffraction and Raman Shift Spectroscopy. The elemental composition of these films [Colour figure can be viewed at wileyonlinelibrary.com] were characterized by means of X-ray photoelectron spectroscopy. The optical absorption of these films were studied by UV-vis absorbance spectra. These results indicated that the nitrogen-doped nanofibers TiO 2 films have mixed phases of anatase and rutile. They also display narrow band gap.The I-V characteristics curves exhibited good conductivity ability. Optical emission spectroscopy (OES) was measured to analyze the active group.

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Atmospheric-pressure plasma CVD of TiO₂photocatalytic films using surface dielectric barrier discharge

Cited by 42 publications

References 21 publications

Deposition temperature dependence of titanium oxide thin films grown by remote‐plasma atomic layer deposition

Deposition temperature dependence of titanium oxide thin films grown by remote‐plasma atomic layer deposition

Effect of ammonia‐derived species on visible‐light photocatalytic activity of Au supported on amorphous TiO₂ activated by plasma

A new method for deposition nitrogen-doped TiO2 nanofibers with mixed phases of anatase and rutile

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Atmospheric-pressure plasma CVD of TiO2photocatalytic films using surface dielectric barrier discharge

Cited by 42 publications

References 21 publications

Deposition temperature dependence of titanium oxide thin films grown by remote‐plasma atomic layer deposition

Deposition temperature dependence of titanium oxide thin films grown by remote‐plasma atomic layer deposition

Effect of ammonia‐derived species on visible‐light photocatalytic activity of Au supported on amorphous TiO2 activated by plasma

A new method for deposition nitrogen-doped TiO2 nanofibers with mixed phases of anatase and rutile

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Atmospheric-pressure plasma CVD of TiO₂photocatalytic films using surface dielectric barrier discharge

Effect of ammonia‐derived species on visible‐light photocatalytic activity of Au supported on amorphous TiO₂ activated by plasma