Atmospheric pressure microwave plasma fluidized bed CVD of AlN coatings

High Temperature Behavior of Si3N4 and Yb2SiO5 Coated Carbon Fibers for Silicon‐Nitride CMC

“…Trichlorosilane (SiHCl 3 , 99%, Sigma–Aldrich GmbH, Germany) is used as Si‐precursor that decomposes in the microwave plasma at temperature between 600 and 1000 °C. The setup of the microwave fluidized bed reactor is published elsewhere . The highly oxidation resistant Yb 2 SiO 5 is deposited by a dip coating process with aqueous solutions containing Yb‐nitrate (Yb(NO 3 ) 3 · x H 2 O, 99.99%, Chempur GmbH, Germany) and colloidal SiO 2 (Ludox AS‐30 colloidal silica, Sigma–Aldrich GmbH).…”

“…As most suitable method to prepare Si 3 N 4 coatings, chemical vapor deposition of silicon followed by a subsequent nitridation was selected and solid state reaction starting from nano‐particulate powders for the Yb 2 SiO 5 coating, as described in detail in the experimental part of the paper. The CVD‐process is performed at ambient pressure with the help of a microwave plasma, as recently developed in our chair for coating short carbon fibers with AlN in a fluidized bed reactor, as described elsewhere . In this work, the coating process established for AlN is modified to produce Si 3 N 4 coatings.…”

Gaseous fluidization of short fibers and powders, influence of temperature and pressure

“…Short fibers, cylindrical in shape and with a form factor of the order of a few tens, can't be included in the Geldart's classification. A few works mention the fluidization of short carbon fibers [5,6,14,15], but their experimental hydrodynamic fluidization behavior has not been experimentally characterized. Some authors have explored the fluidization behavior of rod-like particles or mixtures of rod-like and near-spherical particles.…”

Photocatalytic Activity of Microwave Plasma-Synthesized TiO2 Nanopowder

“…There have been recent reports utilizing the microwave plasma synthesis for the synthesis of metal powders, oxides and nitrides [19][20][21][22][23] as it is possible to ionize gases at relatively lower input power under vacuum or at atmospheric pressure. By the use of the microwave plasma technique, it possible to have a rapid evaporation and decomposition of precursor materials, resulting in the nanocrystallites at lower reaction temperature as compared to those in case of dc or rf plasma [19].…”