Atmospheric pressure metal-organic chemical vapor deposition (AP-MOCVD) growth of undoped and aluminium-doped ZnO thin film using hot wall reactor

Self-textured ZnO via AACVD of alkyl alkoxides: a solution-based seed-less route towards optoelectronic-grade coatings

“…15,22 Therefore, high temperatures are needed to remove the stabilising ligands, which can alter their surface polarity and optoelectronic properties. 6,23 Vapour-phase methods, such as metalorganic chemical vapour deposition (MOCVD), are potentially more advantageous because highly pure and crystalline ZnO coatings are attainable at reasonable reactor temperature ranges during a single step process 24,25 without the need of annealing steps that may trigger surface reconstruction. 6 Still, it should be noted that the choice of precursor and solvent can greatly affect the crystal quality and purity of the resulting film.…”

Influence of Cu doping on the functionality of spray coated SnS2 thin films and its photocatalytic degradation of dyes and antibacterial activity

“…In addition, a decrease in the average transmittance of the thin films is observed as the Cu content increases. Importantly, the absence of oscillatory patterns in the spectrum provides clear evidence that optical interferences were notably absent at the surface of the material [61,62]. The absence of discernible oscillations within the obtained spectra is of particular significance.…”

The effect of Ag doping on the structure, optical, and electronic properties of ZnO nanostructures deposited by atmospheric pressure MOCVD on Ag/Si substrates

“…The variety of perspective applications defines the need for different approaches to the synthesis of ZnO microand nanostructures [1][2][3][4][17][18][19][20][21], as well as the formation of its heterostructures with semiconductors or metal nanostructures [22][23][24]. Atmospheric pressure metal-organic chemical vapour deposition (APMOCVD) is one of the popular methods of fabrication of oxide thin films, micro-and nanostructures, including ZnO [25][26][27][28][29][30][31][32], because it is relatively simple and non-expensive and can provide high-quality material without using catalysts or prepatterned substrates [25]. The possibility to vary the substrates and other deposition parameters allows ZnO with various morphologies, structural, optical, and other properties to be obtained and investigated.…”