2007
DOI: 10.1002/chin.200705205
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Atmospheric Pressure CVD of Molybdenum Diselenide Films on Glass.

Abstract: Atmospheric Pressure CVD of Molybdenum Diselenide Films on Glass. -The title films are prepared by chemical vapor deposition from Et 2 Se or tBu 2 Se and MoCl 5 at 500-650°C. The resulting MoSe2 films are characterized by XRD, ESAX, and SEM. The films are brown in appearance, adhesive, and pass the Scotch tape test, but can be scratched with a steel scalpel. They show high absorbance in the visible spectrum but are more transparent in the near-IR. The CVD route offers an alternative, rapid method for coating w… Show more

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Cited by 3 publications
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“…This limited value is the result of the limited absorption of the semiconductor (MoS 2 ) because of its thickness and limited coverage. The photocurrent generation in TMDC heterostructure generally suffers from two main limitations from an applied point of view, which are their slow response time35 and their strong dependence of the photoresponse with the light intensity6162. In the following we investigate these two properties.…”
Section: Resultsmentioning
confidence: 99%
“…This limited value is the result of the limited absorption of the semiconductor (MoS 2 ) because of its thickness and limited coverage. The photocurrent generation in TMDC heterostructure generally suffers from two main limitations from an applied point of view, which are their slow response time35 and their strong dependence of the photoresponse with the light intensity6162. In the following we investigate these two properties.…”
Section: Resultsmentioning
confidence: 99%
“…More sophisticated routes for the synthesis of these atomic layered materials include molecular beam epitaxy (50) and chemical vapor deposition (CVD). CVD (Figure 3) of TMDs has been successful with a variety of metalorganics [e.g., W(CO) 6 , Mo(CO) 6 ] (51-53) and metal-chlorides (e.g., MoCl 5 , WCl 5 , WOCl 5 , VOCl 5 ) (51,(54)(55)(56), combined with a wide range of chalcogen precursors [H 2 S, HS(CH 2 ) 2 SH, HSC(CH 3 ) 3 , diethyl selenide, di-tert-butylselenide] (51)(52)(53)(54)(55)(56). Each of these processes, although not refined to synthesize atomically thin layers, provides important insight into precursor chemistries suitable for monolayer TMD synthesis.…”
Section: Figurementioning
confidence: 99%
“…However, there are little reports on the ZT values of pure SnSe. Several methods have been developed to prepare SnSe: chemical vapour deposition [125], electrodeposition [126], electron beam irradiation [127], direct vapour transport [120] and chemical synthesis [121].…”
Section: Snsementioning
confidence: 99%