“…More sophisticated routes for the synthesis of these atomic layered materials include molecular beam epitaxy (50) and chemical vapor deposition (CVD). CVD (Figure 3) of TMDs has been successful with a variety of metalorganics [e.g., W(CO) 6 , Mo(CO) 6 ] (51-53) and metal-chlorides (e.g., MoCl 5 , WCl 5 , WOCl 5 , VOCl 5 ) (51,(54)(55)(56), combined with a wide range of chalcogen precursors [H 2 S, HS(CH 2 ) 2 SH, HSC(CH 3 ) 3 , diethyl selenide, di-tert-butylselenide] (51)(52)(53)(54)(55)(56). Each of these processes, although not refined to synthesize atomically thin layers, provides important insight into precursor chemistries suitable for monolayer TMD synthesis.…”