Atmospheric Pressure Alkaline Etching of MFI Zeolite Under Mild Temperature Toward Hollow Microstructure and Ultralow k Film
Kaipeng Zhang,
Ruilan Xu,
Rui Wang
et al.
Abstract:Constructing a hollow structure inside zeolite is very helpful for improving its performance. Unlike the conventional alkaline etching technique usually operated at high temperature (typically 170 °C) and high pressure (autogenerated in autoclave), here, it is discovered that zeolite MFI nano‐box can be achieved under mild etching conditions of atmospheric pressure and low temperature of 80 °C, making it very attractive for energy conservation and practical applications. A hollow‐structure formation mechanism … Show more
Set email alert for when this publication receives citations?
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.