2010
DOI: 10.1063/1.3459965
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Asymmetric ground state spin configuration of transverse domain wall on symmetrically notched ferromagnetic nanowires

Abstract: We report that a ground state spin configuration around a notch of ferromagnetic nanowires can have either symmetric or asymmetric transverse domain wall structure depending on the notch geometry by means of micromagnetic simulation with a systematic variation in the notch aspect ratio. An asymmetric off-centered domain wall configuration becomes stable for a certain range of the notch aspect ratio.

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Cited by 19 publications
(9 citation statements)
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“…To realize such a device, reproducible and reliable pinning sites for individual DWs are required. Geometric constrictions are widely used to create local confining potentials that act as pinning sites for individual DWs [4][5][6][7][8][9][10]. As an alternative, the local modification of magnetic properties by ion irradiation is suitable to induce pinning sites [11].…”
mentioning
confidence: 99%
“…To realize such a device, reproducible and reliable pinning sites for individual DWs are required. Geometric constrictions are widely used to create local confining potentials that act as pinning sites for individual DWs [4][5][6][7][8][9][10]. As an alternative, the local modification of magnetic properties by ion irradiation is suitable to induce pinning sites [11].…”
mentioning
confidence: 99%
“…Thus, notches along the edges of the wire have been widely used to trap domain walls. [19][20][21][22][23][24][25][26] We believe that both pinning and scattering sites can be originated from a local modification of the sample magnetic properties. As it has been reported in previous articles, [27][28][29][30][31][32] magnetic impurities, e.g., localized magnetic modifications obtained by ion irradiation or implantation into magnetic thin films and multilayers have been employed to manipulate and control the magnetization dynamics in nanostructured systems.…”
Section: Introductionmentioning
confidence: 91%
“…The deeper notches pinned the DW more effectively, and the shallower notches were passed over. To resolve all MW states, future devices will require better control of the lithographic notch size and geometry, which could be achieved by altering the notch shape 26,27 and using varying doses to more precisely pattern the notches. In Supplementary Fig.…”
Section: Electrical Characterization Of Magnetic Synapse Prototypesmentioning
confidence: 99%