Asymmetric Block Copolymers with Homopolymers: Routes to Multiple Length Scale Nanostructures

Jeong, Unyong; Kim, Ho-Cheol; Rodríguez, Regina; Tsai, Irene; Stafford, Christopher M.; Kim, Jin Kon; Hawker, Craig J.; Russell, Thomas P.

doi:10.1002/1521-4095(20020219)14:4<274::aid-adma274>3.0.co;2-m

Cited by 157 publications

(130 citation statements)

References 29 publications

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“…We find that homopolymers preferring the shorter blocks are highly localized in the cylinders, consistent with recent experimental observations. 14 We also find that this localization becomes stronger for longer chains. While short neutral homopolymers segregate at the A-B interfaces to screen the repulsion between A and B segments, longer neutral homopolymers exhibit an apparent preference for the cylinders over the matrix, mainly due to geometrical considerations associated with the curvature of A-B interfaces.…”

Section: Discussionsupporting

confidence: 58%

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Behavior of single nanoparticle/homopolymer chain in ordered structures of diblock copolymers

Wang

Nealey

Pablo

2003

The Journal of Chemical Physics

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We have performed Monte Carlo simulations to study the behavior of a single nanoparticle and a single homopolymer chain in ordered structures of diblock copolymers. Our results show that the microphase-separated copolymers can be used to position nanoparticles or homopolymers according to their interactions with the two blocks. This is consistent with recent experimental observations. We also observe that, while short neutral homopolymers segregate at the A-B interfaces, longer neutral homopolymers exhibit an apparent preference for the cylinders over the matrix, mainly due to geometrical considerations associated with the curvature of A-B interfaces.

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Section: Discussionsupporting

confidence: 58%

“…Figure 4 shows that H A is strongly localized at the center of the cylinders due to its energetic interactions; this is consistent with experimental observations. 14 We also see that this localization becomes stronger as N increases.…”

Section: B Single Homopolymer Chain In Cylindrical Structures Of Asymentioning

confidence: 56%

Behavior of single nanoparticle/homopolymer chain in ordered structures of diblock copolymers

Wang

Nealey

Pablo

2003

The Journal of Chemical Physics

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“…33 To try to improve the dot separation, polystyrene (PS, 5K) was added to the PS-b-PDMS (22.5K−4.5K) BCP to increase the notional molecular weight of the PS block. 35,36 The effect of added PS on the resulting patterns is summarized in Figure 2d−l. As can be seen upon close inspection, the addition of PS, up to 15 wt % to PS-b-PDMS (22.5K−4.5K) BCP, results in the dots becoming more clearly distinguishable in both the double-and triple-layer patterns.…”

Section: ■ Results and Discussionmentioning

confidence: 99%

“…The lattice parameter remains constant over this range of added PS, but the dot diameter decreases as a percentage of added PS homopolymer, from 12.4 ± 0.9 to 10.8 ± 0.9 nm, from 0 to 17.5% added PS, respectively. 35,36 Because the same volume of polymer blend in toluene is used to generate the films, the addition of PS results in a decrease in the quantity of PDMS, thus leading to smaller dot diameters. At 20 wt % PS and greater, when added to this BCP, the hexagonal dot patterns become substantially disordered, as shown in the Supporting Information, and thus these patterns were not studied for sequential BCP assembly.…”

Section: ■ Results and Discussionmentioning

confidence: 99%

Sequential Nanopatterned Block Copolymer Self-Assembly on Surfaces

Jin

Olsen

et al. 2016

Langmuir

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Vous avez des questions? Nous pouvons vous aider. Pour communiquer directement avec un auteur, consultez la première page de la revue dans laquelle son article a été publié afin de trouver ses coordonnées. Si vous n'arrivez pas à les repérer, communiquez avec nous à PublicationsArchive-ArchivesPublications@nrc-cnrc.gc.ca. Questions? Contact the NRC Publications Archive team atPublicationsArchive-ArchivesPublications@nrc-cnrc.gc.ca. If you wish to email the authors directly, please see the first page of the publication for their contact information. NRC Publications Archive Archives des publications du CNRCThis publication could be one of several versions: author's original, accepted manuscript or the publisher's version. / La version de cette publication peut être l'une des suivantes : la version prépublication de l'auteur, la version acceptée du manuscrit ou la version de l'éditeur. For the publisher's version, please access the DOI link below./ Pour consulter la version de l'éditeur, utilisez le lien DOI ci-dessous.http://doi.org/10.1021/acs.langmuir.6b01365Access and use of this website and the material on it are subject to the Terms and Conditions set forth at Sequential nanopatterned block copolymer self-assembly on surfaces Jin, Cong; Olsen, Brian C.; Wu, Nathanael L. Y.; Luber, Erik J.; Buriak, Jillian M.http://nparc.cisti-icist.nrc-cnrc.gc.ca/fra/droits L'accès à ce site Web et l'utilisation de son contenu sont assujettis aux conditions présentées dans le site LISEZ CES CONDITIONS ATTENTIVEMENT AVANT D'UTILISER CE SITE WEB. NRC Publications Record / Notice d'Archives des publications de CNRC:http://nparc.cisti-icist.nrc-cnrc.gc.ca/eng/view/object/?id=ae78d03e-4423-4de5-89fb-823bb3c0676b http://nparc.cisti-icist.nrc-cnrc.gc.ca/fra/voir/objet/?id=ae78d03e-4423-4de5-89fb-823bb3c0676bSequential Nanopatterned Block Copolymer Self-Assembly on Surfaces ABSTRACT: Bottom-up self-assembly of high-density blockcopolymer nanopatterns is of significant interest for a range of technologies, including memory storage and low-cost lithography for on-chip applications. The intrinsic or native spacing of a given block copolymer is dependent upon its size (N, degree of polymerization), composition, and the conditions of selfassembly. Polystyrene-block-polydimethylsiloxane (PS-b-PDMS) block copolymers, which are well-established for the production of strongly segregated single-layer hexagonal nanopatterns of silica dots, can be layered sequentially to produce density-doubled and -tripled nanopatterns. The center-tocenter spacing and diameter of the resulting silica dots are critical with respect to the resulting double-and triple-layer assemblies because dot overlap reduces the quality of the resulting pattern. The addition of polystyrene (PS) homopolymer to PS-b-PDMS reduces the size of the resulting silica dots but leads to increased disorder at higher concentrations. The quality of these density-multiplied patterns can be calculated and predicted using parameters easily derived from SEM micrographs of corresponding single...

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“…In another approach, PMMA homopolymer can be added to the BCP to increase the diameter of the cylindrical microdomain, while only increasing the centre-to-centre distance by an amount that is commensurate with the increase in the diameter of the microdomain. Here, by selectively decomposing the PMMA block or by use of a selective solvent, a pore diameter commensurate with the cylindrical microdomain will be obtained [29]. However, if the reconstructed film is thermally annealed, then the PMMA covalently bound to the PS block will be drawn back into [29], a smaller pore can be produced running down the core of the cylindrical microdomain.…”

Section: (A) Ps-b-pi and Ps-b-pbmentioning

confidence: 99%

Pattern transfer using block copolymers

Gunkel

Russell

2013

Phil. Trans. R. Soc. A.

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To meet the increasing demand for patterning smaller feature sizes, a lithography technique is required with the ability to pattern sub-20 nm features. While top-down photolithography is approaching its limit in the continued drive to meet Moore's law, the use of directed self-assembly (DSA) of block copolymers (BCPs) offers a promising route to meet this challenge in achieving nanometre feature sizes. Recent developments in BCP lithography and in the DSA of BCPs are reviewed. While tremendous advances have been made in this field, there are still hurdles that need to be overcome to realize the full potential of BCPs and their actual use.

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Asymmetric Block Copolymers with Homopolymers: Routes to Multiple Length Scale Nanostructures

Cited by 157 publications

References 29 publications

Behavior of single nanoparticle/homopolymer chain in ordered structures of diblock copolymers

Behavior of single nanoparticle/homopolymer chain in ordered structures of diblock copolymers

Sequential Nanopatterned Block Copolymer Self-Assembly on Surfaces

Pattern transfer using block copolymers

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