Assessment of BTI‐induced deterioration in vacuum based undoped structure
Rakesh Kumar,
Meena Panchore
Abstract:In this paper, an assessment of bias temperature instability (BTI) in based dual gate dopingless JLFET (HKV‐DLJLFET) is carried out at 15 nm technology node. For this, the gate dielectric of HKV‐DGDLJLFET is made of asymmetric combination of and vacuum dielectrics near the source/drain (S/D) side, which significantly minimizes the leakage current and enhances the reliability. Our simulation study have shown that the n‐type HKV‐DGDLJLFET exhibits 2.28 and 2.45 times less deterioration in drain current and t… Show more
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