Assessing simultaneous effect of Ar/O2 ratio and process pressure on ammonia sensing properties of reactive DC magnetron sputtered SnO2 thin films

Plasma-induced sub-10 nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level

“…It has also been employed in modern different gas sensors [14][15][16]. In order to fabricate miniaturized and reliable SnO 2 -and In 2 O 3 -based hetero-structured SEs the following technological approaches have recently been proposed: sol-gel [17], solvothermal [18], microwave methods [19,20], spray pyrolysis [21], coaxial electrospinning [22], impregnation [23], hydrothermal deposition [24], ALD and PE-ALD [25][26][27][28][29], chemical vapor deposition (CVD) [30] and sputtering [31]. All these techniques can produce the SE crystalline size within the nm scale strengthening the influence of crystalline shape on the adsorption properties, which determine both gas sensitivity and selectivity.…”

“…Among all fabrication techniques mentioned above, ALD or PE-ALD is a thin-film deposition method based on alternating, self-limiting chemical reactions between the gaseous precursors and solid substrate surface [26]. It can produce high quality, uniform and conformal SE even at the low fabrication temperatures [13,28,[31][32][33][34][35]. This technique enables precise control over the thickness, composition and structure (inter-mixed and/or laminated) of SE [29].…”

“…This technique enables precise control over the thickness, composition and structure (inter-mixed and/or laminated) of SE [29]. The ALD fabrication of SnO 2 nano-films for SE of various sensors was previously reported [28,[31][32][33][34][35]. However, special recipe for ALD process must be developed for SE with high aspect ratio and thickness less than 5.0 nm on the wafer scale [33].…”