2015
DOI: 10.1016/j.apsusc.2015.06.054
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As4 overpressure effects on the phase purity of cubic GaN layers grown on GaAs substrates by RF-MBE

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Cited by 15 publications
(7 citation statements)
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“…High-quality wurtzite GaN has been demonstrated on Si, SiC, and sapphire substrates using MBE and MOCVD, but it has remained difficult to achieve GaN epitaxial growth directly on conventional III–V materials due to the difference in crystal structure. In this work, we have demonstrated crystalline GaN nanostructures epitaxially grown on GaInP 2 without the formation of extensive defects and dislocations using plasma-assisted MBE. High-resolution electron microscopy imaging of the GaN/3J structure confirms a highly crystalline GaN nanostructure epitaxially grown on a GaInP 2 surface with furcated topography.…”
supporting
confidence: 68%
“…High-quality wurtzite GaN has been demonstrated on Si, SiC, and sapphire substrates using MBE and MOCVD, but it has remained difficult to achieve GaN epitaxial growth directly on conventional III–V materials due to the difference in crystal structure. In this work, we have demonstrated crystalline GaN nanostructures epitaxially grown on GaInP 2 without the formation of extensive defects and dislocations using plasma-assisted MBE. High-resolution electron microscopy imaging of the GaN/3J structure confirms a highly crystalline GaN nanostructure epitaxially grown on a GaInP 2 surface with furcated topography.…”
supporting
confidence: 68%
“…Due to these advantages, nitrides in the cubic phase are strong candidates to develop semiconductor devices such as LEDs and photovoltaic devices. However, c-GaN is metastable, causing its growth a difficult challenge 12 . An additional drawback is that under typical growth conditions hexagonal GaN has an intrinsic n-type nature, and if GaN is aimed for optoelectronic applications, then the development of p-type doping of GaN is fundamental for any p–n junction-based device.…”
Section: Introductionmentioning
confidence: 99%
“…The GaN layer was grown at 720 °C employing a Ga-beam equivalent pressure of 2 × 10 −7 Torr and a N 2 flux of 0.25 sccm with an RFpower of 150 W, which result in Ga-rich but near stochiometric conditions, that are known to be optimal for the GaN/ GaAs heteroepitaxy on nominal flat (100) substrates. 18,19) GaN with cubic phase was obtained, as observed from the selected area electron diffraction (SAD) pattern shown in the upper left corner of Fig. 1(a).…”
mentioning
confidence: 94%
“…17) Details concerning GaN growth over GaAs substrates with (100) nominal orientation (flat substrates) have been reported elsewhere. 18) For the present work we employed GaAs(100) substrates misoriented 10°towards the [011] direction [GaAs (100)-10°]. This substrate misorientation produces atomic surface steps with a terrace width of 1 nm.…”
mentioning
confidence: 99%