Artificial control of ZnO nanodots by ion-beam nanopatterning

Abstract

The use of focused ion-beam ͑FIB͒ nanopatterning for manipulating self-assembled ZnO nanodots is described. Highly aligned ZnO-nanodot arrays with various periodicities ͑e.g., 750, 190, and 100 nm͒ on FIB-nanopatterned SiO 2 / Si substrates were prepared by metal-organic chemical-vapor deposition ͑MOCVD͒. The artificially assembled ZnO nanodots had an amorphous structure. Ga atoms incorporated into the surface areas of FIB-patterned nanoholes during FIB engraving were found to play an important role in the artificial control of ZnO, resulting in the production of ZnO nanodots on the FIB-nanopatterned areas. The nanodots evolved into single-crystalline dot clusters and rods with increasing MOCVD-growth time. In addition, microphotoluminescence measurements showed that the ZnO-nanodot arrays have low-dimensional quantum characteristics.

Low-temperature synthesis and characterization of ZnO quantum dots

“…The special application advantages of ZnO QDs and NPs in the area of bioscience also improve more attention due to its "survival lifetime" of a few hours, the slow solubility and high compatibility in biofluid and necessaries of Zn for human beings everyday [11]. Therefore, a number of reports of fabrication, structural, and optical characterization of ZnO QDs have been done in recent years [12][13][14][15][16][17][18].…”

Synthesis, Self-assembly and Optoelectronic Properties of Monodisperse ZnO Quantum Dots

“…As nano-sized ZnO has attracted a lot of attention in the past decade, MOCVD also began to be used in fabricating ZnO nanostructures, such as nanowires, nanorods [104,105]. However, there are not many reports on synthesis of ZnO QDs using MOCVD [60][61][62][63]. Tan et al [60] reported fabrication of ZnO QDs embedded films on Si substrates ( Figure 6).…”

“…Therefore, as-prepared ZnO QDs may be embedded in the SiO2 layer or deposited on the SiO2/Si substrate. Kim et al [62,63] reported fabrication of ZnO QDs assisted with focused ion-beam. Nanosized patterns were made on the substrate by focused ion-beam and high aligned ZnO QDs were prepared along the pattern by MOCVD.…”

“…By far, various kinds of synthetic approaches have been realized in fabricating such small ZnO QDs, which can be roughly divided into chemical methods and physical methods. Chemical methods involves sol-gel method [26][27][28][29][30][31][32][33][34][35][36][37][38][39][40], hydrothermal growth [41][42][43][44], thermal decomposition [45][46][47][48][49][50], electrochemical method [51][52][53][54], while physical methods involves PLA or PLD [55][56][57][58][59], MOCVD [60][61][62][63], sputtering [64][65][66], FSP method [67][68][69][70] and VPT deposition [71,72]. At present, all the methods can be divided into two parts as follow:…”

Simple and cost-effective fabrication of size-tunable zinc oxide architectures by multiple size reduction technique

“…Various methods of patterning ZnO films have been developed to accommodate the trend toward miniaturization of device components. Elaborate nanopatterns are generally fabricated by electron beam lithography (EBL), focused ion beam (FIB) lithography and atomic force microscopy (AFM) nanolithography [6][7][8]. However, these approaches have limitations in both large-scale production and patterning over large areas, owing to their low throughput, high processing cost and sometimes complicated operational procedures.…”