Artifact-free coordinate registration of heterogeneous Large-Scale Metrology systems

Pfeifer, Tilo; Montavon, Benjamin; Peterek, Martin; Hughes, Ben

doi:10.1016/j.cirp.2019.04.077

Cited by 6 publications

(2 citation statements)

References 13 publications

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“…nano-LED), both targeting to use light-over a broad spectrum range-for advanced applications [62][63][64]. Includes all components and systems needed to be manufactured for transportation of people and goods in air and astronauts and instrumentation in space: the aerospace sector is characterised by stringent safety requirements in challenging and changing environments with associated special manufacturing demands [69,70].…”

Section: Nano-and Microelectronicsmentioning

confidence: 99%

New European Metrology Network for advanced manufacturing

Przyklenk

Balsamo

O’Connor

et al. 2021

Meas. Sci. Technol.

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Advanced manufacturing has been identified as one of the key enabling technologies with applications in multiple industries. The growing importance of advanced manufacturing is reflected by an increased number of publications on this topic in recent years. Advanced manufacturing requires new and enhanced metrology methods to assure the quality of manufacturing processes and the resulting products. However, a high-level coordination of the metrology community is currently absent in this field and consequently this limits the impact of metrology developments on advanced manufacturing. In this article we introduce the new European Metrology Network (EMN) for Advanced Manufacturing within EURAMET, the European Association of National Metrology Institutes (NMIs). The EMN is intended to be operated sustainably by NMIs and Designated Institutes in close cooperation with stakeholders interested in advanced manufacturing. The objectives of the EMN are to set up a permanent stakeholder dialogue, to develop a Strategic Research Agenda for the metrology input required for advanced manufacturing technologies, to create and maintain a knowledge sharing programme and to implement a web-based service desk for stakeholders. The EMN development is supported by a Joint Network Project within the European Metrology Programme for Innovation and Research.

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Section: Nano-and Microelectronicsmentioning

confidence: 99%

New European Metrology Network for advanced manufacturing

Przyklenk

Balsamo

O’Connor

et al. 2021

Meas. Sci. Technol.

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“…Furthermore, the integration of LTs into metrological software allows the achievable uncertainty to be predicted in such a way that users can better plan measurements to ensure they are of high quality [2]. Several approaches focus on further optimising measurement uncertainty and process efficiency using LTs, such as multi-lateration [3][4][5] and multi-sensor architectures [6,7]. However, a measuring process based on LTs entails several challenges: the significant costs of the equipment, the high mechanical stability requirements over the observation period, and the need for highly experienced operators [8,9].…”

Section: Introductionmentioning

confidence: 99%

Methodology to Evaluate the Performance of Portable Photogrammetry for Large-Volume Metrology

et al. 2022

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The increased relevance of large-volume metrology (LVM) in industrial applications entails certain challenges: measurements must be cost-efficient and the technologies must be easy to use while ensuring accuracy and reliability. Portable photogrammetry shows great potential to overcome such challenges, but industrial users do not yet rely on its accuracy for large scenarios (3 to 64 m), especially when mass-market cameras are not conceived of as industrial metrology instruments. Furthermore, the measurement results might also depend on the operator’s skills and knowledge of the key process variables. In this work, a methodology was designed so that the measurement uncertainty of portable photogrammetry can be evaluated under controlled conditions for LVM. To do so, PTB’s reference wall, which was designed to assess laser-based methods applied to large volumes, was used as a reference artefact to study the measurement performance under different conditions, enabling an analysis of the relative influence of two process variables: the spatial arrangement of the optical instruments on the scene, and the relative camera poses for an accurate triangulation. According to these variables, different measuring conditions were designed (Monte Carlo analysis), and experimentally evaluated and reported (LME, length measuring errors), analysing the performance figures expected from both unskilled and expert users.

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Determining the extrinsic parameters of a network of Large-Volume Metrology sensors of different types

Maisano

Mastrogiacomo

2022

Precision Engineering

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Artifact-free coordinate registration of heterogeneous Large-Scale Metrology systems

Cited by 6 publications

References 13 publications

New European Metrology Network for advanced manufacturing

New European Metrology Network for advanced manufacturing

Methodology to Evaluate the Performance of Portable Photogrammetry for Large-Volume Metrology

Determining the extrinsic parameters of a network of Large-Volume Metrology sensors of different types

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