1984
DOI: 10.1002/zaac.19845090217
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Arseniodochloride

Abstract: Beim Mischen von AsCl3 und AsI3 in einem inerten Lösungsmittel (CCl4, CS2) stellt sich sofort das Gleichgewicht mit den ternären gemischten Halogeniden ein. Durch photometrische Messungen bei 381 nm konnte die Konzentration von AsI3 im Gemisch bestimmt werden, während die Bestimmung von c AsCl 3 mit Hilfe der Gaschromatographie erfolgte. Den gebildeten Arseniodochloriden ist eine neue Bande bei 345 nm zuzuordnen. Aus den berechneten Gleichgewichts‐konstanten geht die bevorzugte Bildung von AsICl2 hervor, so da… Show more

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Cited by 3 publications
(2 citation statements)
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“…The aim of the surface treatment is the removal of the natural oxide layer, which immediately forms on bare aluminum when exposed to oxygen containing atmospheres [32][33][34] as well as the removal of the disturbed layer being formed during hot rolling. The thickness of oxide layers is highly dependent on the environment and usually increases during heat treatments in air and when exposed to high humidity.…”
Section: Surface Treatmentsmentioning
confidence: 99%
See 1 more Smart Citation
“…The aim of the surface treatment is the removal of the natural oxide layer, which immediately forms on bare aluminum when exposed to oxygen containing atmospheres [32][33][34] as well as the removal of the disturbed layer being formed during hot rolling. The thickness of oxide layers is highly dependent on the environment and usually increases during heat treatments in air and when exposed to high humidity.…”
Section: Surface Treatmentsmentioning
confidence: 99%
“…[3,37] The observed differences caused by the several pickling procedures can be related to their capability to dissolve the natural oxide layer and the superficial phases. Due to the instability of Al 2 O 3 , which is the dominant compound in the oxide layer [32,38,39] in alkaline and acidic solutions, [40] it is likely that the oxide layer can be completely removed by all the NaOH based and the acidic pickling agents. However, pure Si can not be dissolved in NaOH-based solutions, whereas all superficial particles are removed in HNO 3 and HF containing solutions.…”
Section: Surface Treatmentsmentioning
confidence: 99%