Argon plasma etching of fused silica substrates for manufacturing high laser damage resistance optical interference coatings

Juškevičius, Kęstutis; Buzelis, Rytis; Abromavičius, Giedrius; Samuilovas, Romanas; Abbas, Saulė; Belosludtsev, Alexandr; Drazdys, Ramutis; Kičas, Simonas

doi:10.1364/ome.7.003598

Cited by 24 publications

(8 citation statements)

References 25 publications

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“…It was observed that, in most cases, it is a combination of these objectives [1]. Many techniques have been carried out to prepare hybrid coatings including plasma etching [2], layer-by-layer film formation [3], electrospinning [4], chemical vapor deposition (CVD) [5] and the sol-gel process [6]. Compared with the mentioned methods, the sol-gel process is the most used method to produce the hybrid silica coatings because: (a) it allows the control of the product's chemical composition; (b) it is attractive for coating polymers that have melting points between 150 and 300 • C; (c) uniform coatings can easily be fabricated by dipping or spin coating; (d) is low cost and a cost-effectiveness technique and (e) ceramic, glass, metal and polymer substrates can be easily coated [7].…”

Section: Introductionmentioning

confidence: 99%

Preparation and Characterization of Some Sol-Gel Modified Silica Coatings Deposited on Polyvinyl Chloride (PVC) Substrates

Purcar

Rădiţoiu

et al. 2020

Coatings

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Transparent and antireflective coatings were prepared by deposition of modified silica materials onto polyvinyl chloride (PVC) substrates. These materials were obtained by the sol-gel route in acidic medium, at room temperature (25 °C), using different alkoxysilanes with various functional groups (methyl, vinyl, octyl or hexadecyl). Physicochemical and microstructural properties of resulted silica materials and of thin coatings were investigated through Fourier Transforms Infrared Spectroscopy (FTIR), UV-Vis spectroscopy, Thermal Gravimetric Analysis (TGA), Dynamic Mechanical Analysis (DMA), Atomic Force Microscopy (AFM) and ellipsometric measurements. Wetting behaviors of the silica coatings were evaluated by measurement of static contact angle against water. FTIR spectra of materials confirmed the high degree of cross-linking that result from the formation of the inorganic backbone through the hydrolysis and polycondensation reactions together with the formation of the organic network. These sol-gel silica coatings showed a reduction in the reflectance (10%) compared with uncoated PVC substrate. AFM reveals that the films are uniform, and adherent to the substrate, but their morphology is strongly influenced by the chemical composition of the coating matrices. These silica coatings can be useful for potential electronic and optical devices.

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Section: Introductionmentioning

confidence: 99%

Preparation and Characterization of Some Sol-Gel Modified Silica Coatings Deposited on Polyvinyl Chloride (PVC) Substrates

Purcar

Rădiţoiu

et al. 2020

Coatings

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“…First, substrates were washed and dried in a four‐section ultrasound bath. Second, they were etched in a separate chamber by means of argon plasma …”

Section: Methodsmentioning

confidence: 99%

Effect of Annealing on Optical, Mechanical, Electrical Properties and Structure of Scandium Oxide Films

Belosludtsev

Yakimov

Mroczynski

et al. 2019

Physica Status Solidi (a)

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Scandium oxide (Sc2O3) films are deposited by reactive magnetron sputtering. The effects of annealing on the structure, as well as the optical, mechanical, and electrical properties are investigated. The detailed investigation of the mechanical properties and high load indentation resistance in combination with electrical and optical properties is done. It is noted that after annealing at 300 °C, the extinction coefficient and refractive index slightly decreases. It is reported that before and after annealing, Sc2O3 films with cubic phase remains very hard (19 GPa) and resistant to high load (up to 1N) indentation test. Moreover, the effects of post‐deposition annealing on electrical characteristics of metal–insulator–semiconductor (MIS) structures with Sc2O3 gate dielectric layer are investigated. After the annealing procedure, the MIS structures are characterized by lower frequency dispersion, lower flat‐band voltage value, and lower effective charge density. The insulating properties remain at similar level when compared with the devices fabricated with as‐deposited dielectric material. The findings that are in this study make the investigated Sc2O3 films a promising material for various applications in optics, optoelectronic, and electronic semiconductor structures.

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“…The latter issue can efficiently be addressed with the aid of plasmas. As shown by Juškevičius and co-workers, the removal of near-surface layers-and subsurface damage, respectively-with a thickness in the range from 50 to 200 nm via etching by argon radio frequency plasma in vacuum allows a significant increase in LIDT of fused silica surfaces by a factor of 8.4 [27]. Moreover, Zhang and co-workers have successfully applied oxygen plasmas for reducing the number of micro surface defects on zirconium dioxide films.…”

Section: Introductionmentioning

confidence: 98%

Impact of the Polishing Suspension Concentration on Laser Damage of Classically Manufactured and Plasma Post-Processed Zinc Crown Glass Surfaces

Gerhard

Stappenbeck²

2018

Applied Sciences

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Featured Application: The specific application of the presented work is the increase in laser-induced damage threshold of polished components made of optical glasses such as lenses, prisms, and protection windows.Abstract: The laser-induced damage threshold of optics is an issue of essential importance in high-power laser applications. However, the complex and partially interacting mechanisms as well as the underlying reasons for laser damage of glass surfaces are not yet fully understood. The aim of the present work is to contribute to a better understanding of such damage mechanisms by providing original results on the impact of classical glass surface machining on the laser-induced damage threshold. For this purpose, glass samples were prepared with well-defined process conditions in terms of the used lapping and polishing agents and suspensions. Further, the samples were post-processed by atmospheric pressure plasma for precision cleaning. The laser-induced damage threshold and surface contamination by residues from the manufacturing process were determined before and after plasma post-processing. It is shown that the polishing suspension concentration has a certain impact on the laser-induced damage threshold and surface contamination by residues from used working materials. The highest damage threshold of 15.2 J/cm 2 is found for the lowest surface contamination by carbon which occurs in the case of the highest polishing suspension concentration. After plasma treatment for merely 60 s, this value was increased to 20.3 J/cm 2 due to the removal of surface-adherent carbon. The results thus imply that the laser-induced damage threshold can notably be increased by first choosing appropriate process parameters during classical manufacturing and second plasma post-processing for surface finishing.

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Argon plasma etching of fused silica substrates for manufacturing high laser damage resistance optical interference coatings

Cited by 24 publications

References 25 publications

Preparation and Characterization of Some Sol-Gel Modified Silica Coatings Deposited on Polyvinyl Chloride (PVC) Substrates

Preparation and Characterization of Some Sol-Gel Modified Silica Coatings Deposited on Polyvinyl Chloride (PVC) Substrates

Effect of Annealing on Optical, Mechanical, Electrical Properties and Structure of Scandium Oxide Films

Impact of the Polishing Suspension Concentration on Laser Damage of Classically Manufactured and Plasma Post-Processed Zinc Crown Glass Surfaces

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