Argon metastables in a high density processing plasma

Leonhardt, D.; Eddy, Charles R.; Shamamian, V. A.; Fernsler, R. F.; Butler, James E.

doi:10.1063/1.367123

Cited by 35 publications

(28 citation statements)

References 23 publications

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“…Note that these data were obtained at a distance of 20 cm from the target. Data on metastable Ar atoms are in good agreement with the results obtained in a high-density plasma discharges [16][17][18]. We also did not account for Penning ionization of Cu and Ar atoms.…”

Section: Resultssupporting

confidence: 74%

Probe and Emission Spectrometry Diagnostics in Hollow Cathode Magnetron

Poluektov¹,

Tsar’gorodsev²,

Usatov³

et al. 2012

JMP

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This paper deals with the characterization of an ionized physical vapor deposition (IPVD) by means of hollow cathode magnetron. Langmuir probe, optical emission spectroscopy measurements were used to study a mechanism for the production of excited argon and copper atoms and ions. The kinetic processes of excitation were considered and the main processes were determined using results of measurements. The pressure range is 0.5 - 10 mTorr with 1- 5 kW discharge power. Plasma parameters such as electron densities and temperatures, electron energy distribution function, plasma space and floating potentials as a function of the position, pressure and power in the growth chamber were measured. The plasma density is up to 1012 cm?3 at 20 cm from the magnetron for 10 mTorr

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Section: Resultssupporting

confidence: 74%

Probe and Emission Spectrometry Diagnostics in Hollow Cathode Magnetron

Poluektov¹,

Tsar’gorodsev²,

Usatov³

et al. 2012

JMP

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“…Metastable species formation are also important electron energy-loss mechanisms and are significant for surface reactions in Ar plasmas along with H atom creation in Ar/H 2 plasmas, though they are notoriously hard to quantify through direct plasma observation techniques. Ar metastables have long lifetimes, carry significant energy that can be transferred to atoms/molecules causing Penning ionization/dissociation, and occur at high densities in lowtemperature plasmas [7][8][9]. Ar metastable atoms in Ar plasma and Ar plasma mixtures have been used for low-energy patterning of surfaces [10,11] Quantification of metastables in Ar plasmas [12][13][14] and Ar/reactive gas mixtures [15][16][17] by optical methods has been a topic of great interest.…”

Section: Introductionmentioning

confidence: 99%

Determination of Ar metastable atom densities in Ar and Ar/H₂inductively coupled low-temperature plasmas

Fox-Lyon¹,

Knoll²,

Franek³

et al. 2013

J. Phys. D: Appl. Phys.

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Ar metastable atoms are important energy carriers and surface interacting species in low-temperature plasmas that are difficult to quantify. Ar metastable atom densities (N Ar,m) in inductively coupled Ar and Ar/H 2 plasmas were obtained using a model combining electrical probe measurements of electron density (N e) and temperature (T e), with analysis of spectrally resolved Ar plasma optical emission based on 3p → 1s optical emission ratios of the 419.8 nm line to the 420.1 nm line. We present the variation of N Ar,m as the Ar pressure and the addition of H 2 to Ar are changed comparatively to recent adsorption spectroscopy measurements.

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“…[12][13][14] There have been a number of experiments and theoretical calculations especially on argon atom metastable states (1s 3 and 1s 5 in Paschen notation) density with regard to plasma power or pressure. In experiments, various techniques such as laser induced fluorescence (LIF), [15][16][17][18] laser absorption spectroscopy (LAS), 16,[19][20][21][22][23][24][25] and optical emission spectroscopy (OES) (Refs. [26][27][28][29] were used to measure 1D or 2D distribution of metastable density.…”

Section: Introductionmentioning

confidence: 99%