Abstract:Herein, we propose a novel approach for area-selective tunable growth of uniform monolayer or bilayer WS 2 on dielectric substrates through in situ conversion of a predeposited W metal pad to WO x initially and then to WS 2 mono-and bilayers. Compared with the various transfer methods that have been used previously for multilayer stacking, this direct-growth method has the advantages of producing cleaner interfaces and the capability of growing tunable layers on target substrates, thereby making it more suitab… Show more
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