Area-selective atomic layer deposition of molybdenum oxide

Abstract

have supervised the work.Per-Anders and Ola, there is no way this thesis could be finished without you. Per-Anders, you are truly an excited person and I have never met anyone so passionate about his or her own field as you. That passion is contagious, and so is your cheerfulness and joy to share your knowledge. Ola, you are the most understanding and supporting person on the planet. Your response time is amazingly fast and you take all stupid and not so stupid questions seriously. You see every find as an opportunity, and that is great. When I saw an ALD system not behaving, only depositing on certain surfaces, you saw the chance to explore an area-selective system. I am so deeply grateful to both of you.I am also very grateful to Øystein Evandt and his insight on Design of Experiments (DoE), that he is always more than willing to share. Moreover, a special thank you goes to Dr. David Wragg for his aid with Pawley refinements and to my co-author on Paper I, Jon Borgersen. Making the world's second smallest university logo would not have been possible without you. Augustinas Galeckas, co-author on Paper III, has my sincere gratitude for a swift response and aiding with various optical measurements.Thank you all.During my many years at NAFUMA I have had a lot of nice colleagues and even shared office with many of you. I have probably been of the more talkative kind of office mate, but I think most of you managed ok. Thanks for making work-life good. Special thanks go to Kristian x2, Leva, Michael and Katja, for particularly good company.The largest thank you goes to the people surrounding me. Luckily, that is a lot of people and I am so blessed to have each and every one of you. I am looking forward to times where we can all gather up for large family dinners again, although fitting 25+ people in our house is kind-of tight. Special thanks go to my parents for their endless support and babysitting. You have thought me persistence, perfectionism and hard work, and always taken for granted that I would be able to reach my goals.Thanks for having that belief, also at times where I lost it myself. A huge thank you goes to my in-laws for cheering and babysitting, including my always calm, positive and caring sister-in-law. I also want to thank the engineers in my family, particularly my grandfather, for inspiring me towards a scientific career. Kaja also deserves a huge thank you, simply for existing. Thanks for being my best friend since we started schooland staying with me until now when I finally finish my formal education.Many times during this process, I have been told that pursuing a PhD whilst having three kids, is something you just don't do. It pisses of my inner feminist, but they do have a point, combining sleepless iv nights, dreadful pregnancies and having to make it home before the kindergarten closes whilst pursuing a phd, is not always a primrose path. My favorite counterargument for this is that children give you the best possible mental timeouts from your work. And trust me, in this process, you need m...

Reliable high work-function molybdenum dioxide synthesis via template-effect-utilizing atomic layer deposition for next-generation electrode applications

“…Most of the deposition processes, such as chemical vapor deposition and atomic layer deposition (ALD), based on the oxidation reaction only achieved MoO 3 thin film, which is an insulator. 20,21 In this regard, MoO 2 thin films cannot be prepared using ALD methods even though ALD is the key to applying MoO 2 thin films to DRAM capacitors, resulting in the utilization of MoO 2 for actual electronic devices being limited.…”

Quinizarin: a large aromatic molecule well suited for atomic layer deposition

“…This gives rise to completely new possibilities in designing with combinations of material properties 8 and to control optical and electronic interactions 9 . While ALD normally coats all surfaces similarly, area-selective deposition is possible and is an expanding field 10 .…”