2019
DOI: 10.1364/ol.44.001072
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Are graphene-Bi2Te3van der Waals heterostructure-based saturable absorbers promising for solid-state Q-switched lasers?

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Cited by 8 publications
(2 citation statements)
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“…Studies found that, the SA has faster carrier dynamics and greater modulation‐depth than the layered material alone. Since then, mode‐locked/Q‐switched lasers using layered materials heterostructures have attracted wide attention . These efforts have injected new vitality into the research of ultrafast photonics.…”
Section: Versatile Pulsed Lasers Using 2d Layered Materialsmentioning
confidence: 99%
“…Studies found that, the SA has faster carrier dynamics and greater modulation‐depth than the layered material alone. Since then, mode‐locked/Q‐switched lasers using layered materials heterostructures have attracted wide attention . These efforts have injected new vitality into the research of ultrafast photonics.…”
Section: Versatile Pulsed Lasers Using 2d Layered Materialsmentioning
confidence: 99%
“…Table SI summarizes some of the leading examples of vdW and their applications in different fields in the Supporting Information. It can be found that despite the explorations of different applications of vdW of 2D materials with TMs, there is limited or no report on their charge carrier and phonon dynamics, where such studies are vital in confirming the potential of such heterostructures in applications. , , In the present study, the fabrication of vdW of bismuth telluride (Bi 2 Te 3 ), a well-known TM, with graphene, fluorographene, and molybdenum disulfide (MoS 2 ) atomic layers via a simple stacking of layers over a few layers of TM is achieved. These three different 2D systems are considered to form heterostructures with the TM and due to the difference in the parent properties of these layers, such as one is a semimetallic 2D system (graphene , ), the second one is a semiconducting defective 2D system (flurographene , ), and the third one is a 2D semiconductor with excitonic carriers (MoS 2 ).…”
Section: Introductionmentioning
confidence: 92%