2020
DOI: 10.1021/acsapm.0c00240
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Architecture of Hydrated Multilayer Poly(methacrylic acid) Hydrogels: The Effect of Solution pH

Abstract: We report on the evolution of the internal structure of dry and hydrated poly(methacrylic acid) (PMAA) hydrogels by quantifying the extent of layer interdiffusion in hydrogen-bonded (HB) films and upon subsequent cross-linking and hydration. These hydrogels are produced by ethylenediamine (EDA)-assisted cross-linking of PMAA in spinassisted (SA) and dipped HB PMAA/poly(N-vinylpyrrolidone) (PVPON) multilayers followed by complete release of PVPON at pH 8 due to severing of hydrogen bonds with the PMAA network. … Show more

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Cited by 8 publications
(71 citation statements)
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“…Polymers were dissolved in phosphate buffer (0.01 M, pH = 2.5) at a concentration of 1 mg mL –1 and deposited using a SA LbL technique (spin-coater acquired from Laurell Technologies) on silicon wafers with a thick (300 nm) SiO 2 layer. Prior to the deposition of hydrogen-bonded multilayers, silicon wafers were thoroughly cleaned as described elsewhere . An initial PGMA layer was spin-cast from a 0.089 mg mL –1 chloroform solution onto the cleaned silicon wafer, followed by heating at 110 °C for 1 h and washing with chloroform, resulting in a 2 nm PGMA monolayer when dry.…”
Section: Methodsmentioning
confidence: 99%
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“…Polymers were dissolved in phosphate buffer (0.01 M, pH = 2.5) at a concentration of 1 mg mL –1 and deposited using a SA LbL technique (spin-coater acquired from Laurell Technologies) on silicon wafers with a thick (300 nm) SiO 2 layer. Prior to the deposition of hydrogen-bonded multilayers, silicon wafers were thoroughly cleaned as described elsewhere . An initial PGMA layer was spin-cast from a 0.089 mg mL –1 chloroform solution onto the cleaned silicon wafer, followed by heating at 110 °C for 1 h and washing with chloroform, resulting in a 2 nm PGMA monolayer when dry.…”
Section: Methodsmentioning
confidence: 99%
“…A PMAA layer was then spin-cast onto the PGMA-primed wafers from a 1 mg mL –1 methanol solution and crosslinked at 80 °C for 40 min, followed by rinsing with DI water. (PMAA/PVPON) n LbL films were spin-casted onto PGMA-PMAA primed wafers as described previously . Briefly, PVPON ( M w = 58 kDa) or PMAA ( M w = 100 kDa) 1 mg mL –1 solutions in 0.01 M phosphate buffer at pH = 2.5 were alternately deposited in 3 mL aliquots onto the wafers and rotated for 30 s at 3000 rpm on a spin-coater; then rinsed twice for 30 s with the phosphate buffer solution before the deposition of the next layer.…”
Section: Methodsmentioning
confidence: 99%
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“…Hydrogen-bonded (PVPON/PMAA–NH 2 ) n multilayers, where n denotes the number of polymer bilayers, were assembled on silicon wafers (University Wafer) using dipping LbL. First, a PGMA/PMAA precursor was covalently attached to the wafer surface to anchor the multilayer hydrogel to the surface . For that, PGMA chloroform solution (0.09 mg mL –1 ) spin-coated onto a wafer was heated for an hour at 110 °C in an oven.…”
Section: Methodsmentioning
confidence: 99%
“…First, a PGMA/PMAA precursor was covalently attached to the wafer surface to anchor the multilayer hydrogel to the surface. 43 For that, PGMA chloroform solution (0.09 mg mL −1 ) spin-coated onto a wafer was heated for an hour at 110 °C in an oven. Unattached PGMA was rinsed off using chloroform three times.…”
Section: ■ Experimental Sectionmentioning
confidence: 99%