Abstract:1. Introduction 1.1 Simulation based on measured development rate measurements EUV lithography is a reduced projection lithography technology based on 13.5 nm wavelength EUV (Extreme Ultraviolet). Development of EUV lithography is currently underway for the mass production of semiconductor devices for 90 nm design rule applications for ArF dry exposures and for 65 to 45 nm design rule applications for ArF immersion exposures [1][2]. EUV lithography is among the most promising next-generation lithography tools … Show more
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