2011
DOI: 10.1016/j.snb.2011.07.058
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Applying pure water plugs for electroosmotic flow monitoring in microchip electrophoresis

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Cited by 3 publications
(2 citation statements)
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“…Electrochemical (EC) detection schemes [21][22][23][24] are gaining acceptance and maturity, mainly due to their high sensitivity, ease of application and possibility of electrode integration into the chip during the fabrication process, leading to fully integrated microfluidic systems [25][26][27].Currently, polymeric MEs have displaced the more traditional glass devices [17], due to a lower cost of materials and simplicity of fabrication techniques. A wide range of polymeric substrates with different fabrication protocols is reported in the literature [28][29][30]. The photoresist EPON SU-8 (SU-8), a negative tone epoxy photopatternable resist, mechanically reliable, optically transparent, chemically resistant and hydrophilic, has been used to fabricate ME devices [18,24,31].…”
mentioning
confidence: 99%
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“…Electrochemical (EC) detection schemes [21][22][23][24] are gaining acceptance and maturity, mainly due to their high sensitivity, ease of application and possibility of electrode integration into the chip during the fabrication process, leading to fully integrated microfluidic systems [25][26][27].Currently, polymeric MEs have displaced the more traditional glass devices [17], due to a lower cost of materials and simplicity of fabrication techniques. A wide range of polymeric substrates with different fabrication protocols is reported in the literature [28][29][30]. The photoresist EPON SU-8 (SU-8), a negative tone epoxy photopatternable resist, mechanically reliable, optically transparent, chemically resistant and hydrophilic, has been used to fabricate ME devices [18,24,31].…”
mentioning
confidence: 99%
“…Currently, polymeric MEs have displaced the more traditional glass devices [17], due to a lower cost of materials and simplicity of fabrication techniques. A wide range of polymeric substrates with different fabrication protocols is reported in the literature [28][29][30]. The photoresist EPON SU-8 (SU-8), a negative tone epoxy photopatternable resist, mechanically reliable, optically transparent, chemically resistant and hydrophilic, has been used to fabricate ME devices [18,24,31].…”
mentioning
confidence: 99%