Proceedings of IEEE Custom Integrated Circuits Conference - CICC '94
DOI: 10.1109/cicc.1994.379715
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Applying a submicron mismatch model to practical IC design

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Cited by 15 publications
(3 citation statements)
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“…Although several corrections and extensions to the DSM region, such as those presented in [12], [15], and more recently in [19] and [16], have been proposed, the model proposed by Pelgrom et al [11] is still the most widely used in the current practice.…”
Section: A Mismatch Modelingmentioning
confidence: 99%
“…Although several corrections and extensions to the DSM region, such as those presented in [12], [15], and more recently in [19] and [16], have been proposed, the model proposed by Pelgrom et al [11] is still the most widely used in the current practice.…”
Section: A Mismatch Modelingmentioning
confidence: 99%
“…As a main result, identically designed and biased devices display different statistical behaviors [1]. Since MOS transistor mismatch constitutes a serious limiting factor for the accuracy of VLSI circuits including digital-to-analog converters, sense amplifiers for memory arrays, reference sources, etc., accurate statistical modeling of transistors is a critical factor in designing ICs [2], [3]. Recent works have proposed, for short devices, changes in the local variation term of the well-known Pelgrom's mismatch model [4], [5].…”
Section: Introductionmentioning
confidence: 99%
“…Additive error arises from threshold offsets between the pairs of input MOS in the squaring circuit. As these transistors are neighboring and non-minimum (5pmx3pm), we expect a matching in excess of 8 bits (< 8mV offset over a 2V dynamic) [17].…”
Section: 3: Precision Limitations Of Current-modementioning
confidence: 99%