Applications of SIMS, SAES and XPS to problems in the semiconductor industry

Alnot, P.; Huber, A. M.; Olivier, J.

doi:10.1002/sia.740090504

Cited by 11 publications

(1 citation statement)

References 31 publications

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“…During this process, material is sputtered away and secondary ion species are generated, analyzed in a mass analyzer, and detected as a mass spectrum for each pixel in an image. With a detection limit in the parts per million or even parts per billion range and its high mass- and spatial-resolution capabilities, the SIMS technique is highly applicable for analysis of different materials such as semiconductors, 20 geological and cosmological samples, 21 metals, 22 and biological samples. 23 − 25 In a previous study, we showed the potential of time-of-flight SIMS (ToF-SIMS) to visualize and relatively quantify iron accumulation in human lung tissue sections.…”

Section: Introductionmentioning

confidence: 99%

Correlative High-Resolution Imaging of Iron Uptake in Lung Macrophages

et al. 2022

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Detection of iron at the subcellular level in order to gain insights into its transport, storage, and therapeutic prospects to prevent cytotoxic effects of excessive iron accumulation is still a challenge. Nanoscale magnetic sector secondary ion mass spectrometry (SIMS) is an excellent candidate for subcellular mapping of elements in cells since it provides high secondary ion collection efficiency and transmission, coupled with high-lateral-resolution capabilities enabled by nanoscale primary ion beams. In this study, we developed correlative methodologies that implement SIMS high-resolution imaging technologies to study accumulation and determine subcellular localization of iron in alveolar macrophages. We employed transmission electron microscopy (TEM) and backscattered electron (BSE) microscopy to obtain structural information and high-resolution analytical tools, NanoSIMS and helium ion microscopy-SIMS (HIM-SIMS) to trace the chemical signature of iron. Chemical information from NanoSIMS was correlated with TEM data, while high-spatial-resolution ion maps from HIM-SIMS analysis were correlated with BSE structural information of the cell. NanoSIMS revealed that iron is accumulating within mitochondria, and both NanoSIMS and HIM-SIMS showed accumulation of iron in electrolucent compartments such as vacuoles, lysosomes, and lipid droplets. This study provides insights into iron metabolism at the subcellular level and has future potential in finding therapeutics to reduce the cytotoxic effects of excessive iron loading.

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Section: Introductionmentioning

confidence: 99%

Correlative High-Resolution Imaging of Iron Uptake in Lung Macrophages

et al. 2022

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X‐Ray Photoelectron Spectroscopy in Analysis of Surfaces

Oswald

2000

Encyclopedia of Analytical Chemistry

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X‐ray photoelectron spectroscopy (XPS) is an analytical technique that uses photoelectrons excited by X‐ray radiation (usually Mg Kα or Al Kα) for the characterization of surfaces to a depth of 2–5 nm. Elemental identification and information on chemical bonding are derived from the measured electron energy and energy shifts, respectively. The use of ultrahigh vacuum (UHV) during analysis requires special sample handling. Depth profiling is possible using ion sputtering. In contrast to the most popular surface analytical technique, Auger electron spectroscopy (AES), nonconducting material can be investigated, little material damage occurs, and the chemical shifts are easier to interpret. However, the lateral resolution of AES (typically 50 nm) is much greater than for XPS (50 µm for standard equipment, down to lower than 3 µm for dedicated instruments). The detection limit (of about 0.1 atom %) is not as low as for mass spectroscopic techniques, but the quantification from XPS peak area measurements is much better, even disclaiming standard sample measurements. This article briefly discusses the principles of the technique, sample requirements, and the typical measuring strategy. Possible information sources (elements, chemical bonding, depth and lateral distributions) are described and their quantification principles are summarized. The main part deals with typical applications relating to several material classes (metals, semiconductors, insulators, polymers) to give a feeling for the effectiveness of the method over a wide range of research and technological problems. A comparison with similar techniques is given as a summary. Technological developments in electronics, nanotechnology, polymers, biotechnology and medicine are all concerned with surface‐related phenomena, suggesting sustained interest in XPS in the foreseeable future.

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X‐Ray Photoelectron Spectroscopy in Analysis of SurfacesUpdate based on the original article by Steffen Oswald,Encyclopedia of Analytical Chemistry, © 2000, John Wiley & Sons, Ltd.

Oswald

2013

Encyclopedia of Analytical Chemistry

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X‐ray photoelectron spectroscopy (XPS) is an analytical technique that uses photoelectrons excited by X‐ray radiation (usually Mg Kα or Al Kα) for the characterization of surfaces to a depth of 2–5 nm. Elemental identification and information on chemical bonding are derived from the measured electron energy and energy shifts, respectively. The use of ultrahigh vacuum (UHV) during analysis requires special sample handling. Depth profiling is possible using ion sputtering. In contrast to the most popular surface analytical technique, Auger electron spectroscopy (AES), nonconducting material can be investigated, weak material damage occurs, and the chemical shifts are easier to interpret. However, the lateral resolution of the complementary AES technique (typically down to 20 nm) is much better than for XPS (50 µm for standard equipment, down to lower than 3 µm for dedicated instruments). The detection limit (of about 0.1 at%) is not as low as for mass spectroscopic techniques, but the quantification from XPS peak area measurements is more reliable, even disclaiming standard sample measurements. This article briefly discusses the principles of the technique, sample requirements, and the typical measuring strategy. Possible information sources (elements, chemical bonding, depth and lateral distributions) are described and their quantification principles are summarized. The main part deals with typical applications relating to several material classes (metals, semiconductors, insulators, and polymers) to give an impression of the capabilities of the method over a wide range of research and technological problems. A comparison with further complementary analytical techniques is given as a summary. Technological developments in electronics, nanotechnology, polymers, biotechnology, and medicine are all concerned with surface‐related phenomena, suggesting sustained interest in XPS in the foreseeable future.

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Applications of SIMS, SAES and XPS to problems in the semiconductor industry

Cited by 11 publications

References 31 publications

Correlative High-Resolution Imaging of Iron Uptake in Lung Macrophages

Correlative High-Resolution Imaging of Iron Uptake in Lung Macrophages

X‐Ray Photoelectron Spectroscopy in Analysis of Surfaces

X‐Ray Photoelectron Spectroscopy in Analysis of SurfacesUpdate based on the original article by Steffen Oswald,Encyclopedia of Analytical Chemistry, © 2000, John Wiley & Sons, Ltd.

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