Applications of dynamic recoil mixing (DRM)

Ion–assisted sputter deposition

“…A fine balance between re-sputtering and deposition allowed the thin-film thickness to be maintained constant at a value commensurate with the ion range so that a substantial intermixing of the materials A and B occurred. The layers produced had excellent adhesion and this DRM process allowed formation of ultra-thin surface-modified layers with interesting electrical properties (Colligon et al . 1984).…”