Application of zirconium silicon oxide films to an attenuated phase-shifting mask in ArF lithography

Onodera, T.; Nakazawa, K.; Ogawa, T.; Morimoto, H.; Haraguchi, T.; Fukuhara, N.; Matsuo, T.; Otaki, M.; Takeuchi, S.

doi:10.1109/imnc.1999.797560

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference

DOI: 10.1109/imnc.1999.797560

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Application of zirconium silicon oxide films to an attenuated phase-shifting mask in ArF lithography

T. Onodera¹,

K. Nakazawa²,

T. Ogawa³

et al.

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Application of zirconium silicon oxide films to an attenuated phase-shifting mask in ArF lithography

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