2002
DOI: 10.1007/s00542-001-0154-6
|View full text |Cite
|
Sign up to set email alerts
|

Application of UV depth lithography and 3D-microforming for high aspect ratio electromagnetic microactuator components

Abstract: This paper was presented at the Fourth International Workshop on High Aspect Ratio Micro-Structure Technology (HARMST) 2001 in Baden-Baden, Germany.For building high aspect ratio parts, using a combination of UV lithography and electroplating is a very promising approach. This paper describes investigations regarding the application of UV lithography and electroplating to fabricate high aspect ratio component parts of microactuators, such as coils and pole pieces. As resist materials, both novolac-based resist… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
9
0

Year Published

2004
2004
2013
2013

Publication Types

Select...
4
2

Relationship

2
4

Authors

Journals

citations
Cited by 17 publications
(9 citation statements)
references
References 2 publications
0
9
0
Order By: Relevance
“…The structures were manufactured by electropolating following a photoresist process [18]. The investigated test plates differ in their surface coverage H. The surface coverage is the fraction of the referenced smooth surface, which is covered by cubes (Eq.…”
Section: Surface Structuresmentioning
confidence: 99%
“…The structures were manufactured by electropolating following a photoresist process [18]. The investigated test plates differ in their surface coverage H. The surface coverage is the fraction of the referenced smooth surface, which is covered by cubes (Eq.…”
Section: Surface Structuresmentioning
confidence: 99%
“…Plating rate can be increased by using FIGURE 28.4 Typical high-aspect-ratio structure obtained with epoxy resin. (Reproduced from [8] with permission from Springer Science þ Business Media.) high metal ion concentrations and/or by decreasing the diffusion boundary layer thickness through forced electrolyte convection.…”
Section: Characteristic Features Of Electrodeposition Through High-ar Patternsmentioning
confidence: 99%
“…UV-depth lithography with DNQ/Novolak resist (AZ 9260, Clariant) and photo sensitive epoxy (SU-8, MCC) was applied for high aspect ratio micromolds [17,18]. The SU-8 resist was left in place and served as an organic, encapsulating dielectric film with excellent planarization capabilities [19].…”
Section: Technologymentioning
confidence: 99%