2008
DOI: 10.1016/j.jallcom.2006.11.184
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Application of two-dimensional polystyrene arrays in the fabrication of ordered silicon pillars

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Cited by 51 publications
(48 citation statements)
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“…To overcome this challenge we recommend adapting a well-tested method for sizecontrollable nanostructure array formation using self-assembled polystyrene beads. [47][48][49] In this nanosphere lithography method polystyrene beads are applied to the surface of the PV and close packed through self-assembly. The size of the columns and the spacing is controlled by selection of the initial bead sizes and subsequent reactive ion etching.…”
Section: Resultsmentioning
confidence: 99%
“…To overcome this challenge we recommend adapting a well-tested method for sizecontrollable nanostructure array formation using self-assembled polystyrene beads. [47][48][49] In this nanosphere lithography method polystyrene beads are applied to the surface of the PV and close packed through self-assembly. The size of the columns and the spacing is controlled by selection of the initial bead sizes and subsequent reactive ion etching.…”
Section: Resultsmentioning
confidence: 99%
“…31,32 Other techniques to make black silicon do not need photolithography. The masks are made of silica or polystyrene [33][34][35] particles directly deposited on silicon.…”
Section: Black Siliconmentioning
confidence: 99%
“…It was proposed that diameter of thinned PS particles d and oxygen etching time t obeyed the empirical equation 20,46,47 …”
Section: B Effects Of O 2 Plasma Rie To Ps Nanospheresmentioning
confidence: 99%
“…Nanosphere lithography (NSL) [9][10][11][12] is a promising nanofabrication technology that is inexpensive, high-throughput, materials general a Author to whom correspondence should be addressed. and has been demonstrated to be well suited to fabricate nanoholes, [13][14][15] metallic nanomesh electrodes, 16,17 or silicon, [18][19][20] noble metal, 21 cobalt, 22,23 and gallium nitride nanorod arrays. 24 The function of NSL relies on templates for nanostructure patterning.…”
Section: Introductionmentioning
confidence: 99%