Application of ToF-SIMS surface analysis to tribochemistry in metal forming processes

Dauchot, Gilles; Castro, Elvé de; Repoux, Monique; Combarieu, R.; Montmitonnet, Pierre; Delamare, François

doi:10.1016/j.wear.2005.03.034

Cited by 25 publications

(16 citation statements)

References 20 publications

(22 reference statements)

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“…The presence of metal cations at the substrate surface is of particular interest since the likelihood of reaction between iron oxide and carboxylic acid friction modifier resulting in the formation of a chemisorbed iron carboxylate film has been a topic of much debate amongst scientists in the field. Whilst it has been argued that the reaction to yield iron carboxylate is thermodynamically unfavourable [30], more recent surface analyses by techniques such as ToF-SIMS and FTIR support the formation of metal carboxylate [31][32][33].…”

Section: The Chemistry Of the Mica Surfacementioning

confidence: 99%

In Situ Study of Model Organic Friction Modifiers Using Liquid Cell AFM; Saturated and Mono-unsaturated Carboxylic Acids

et al. 2015

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Fatty acids and their derivatives have been used as model organic friction modifiers for almost a century, but there is still debate as to the nature of the boundary films that they form on rubbed surfaces. In this study, in situ liquid cell atomic force microscopy (AFM) is used to monitor the self-assembly of boundary films from solutions of fatty acids in alkanes on to mica surfaces. Because the mica surfaces are wholly immersed in solution it is possible to study directly changes in the morphology and friction of these films over time and during heating and cooling.It has been found that stearic and elaidic acid, that are able to adopt a linear molecular configurations, form irregular islands on mica that are tens to hundreds of microns in diameter and typically 1.6 nm thick, corresponding to domains of tilted single monolayers. At a relatively high concentration of 0.01M, stearic acid in hexadecane forms an almost complete monolayer, but at lower concentrations, in dodecane solution and for elaidic acid solutions these films remain incomplete after prolonged immersion of more than a day. The films formed by fatty acids on mica are displaced by repeated scanning in contact mode AFM but can be imaged without damage using tapping mode AFM.Rubbed quartz surfaces from a sliding ball-on-disc test were also scanned ex-situ using AFM and these showed that stearic acid forms similar monolayer island films on quartz in macroscale friction experiments as are found on mica.Oleic acid solutions behave quite differently from stearic acid and elaidic acid, forming irregular globular films on both mica and rubbed quartz surfaces. This is believed to be because its cis-double bond geometry means that, unlike its trans-isomer elaidic acid or saturated stearic acid, it is unable to adopt a linear molecular configuration and so is less able to form close-packed monolayers.

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Section: The Chemistry Of the Mica Surfacementioning

confidence: 99%

In Situ Study of Model Organic Friction Modifiers Using Liquid Cell AFM; Saturated and Mono-unsaturated Carboxylic Acids

et al. 2015

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“…Such a technique gives access to the molecular nature of the extreme surface. ToF-SIMS analysis has already been conducted in tribological studies on other materials and in different cases: Diamond-like Carbon (DLC) [27][28][29][30], zinc dithiophosphate additives [31], and metals [32,33]. Extensively used for decrypting DLC lubrication, it allowed validating the beneficial role of hydrogen (H) in the superlow friction of DLC.…”

Section: Introductionmentioning

confidence: 99%

Time-of-Flight Secondary Ion Mass Spectroscopy investigation of the chemical rearrangement undergone by MoS2 under tribological conditions

et al. 2015

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“…25 In order to confirm element nickel is existed in particle instead with the chemical state of Ni(NO 3 ) 2 in the solution of composite sol, Ni-doped colloidal silica abrasive was purified by centrifugation and then washing with deionized water for several times before characterization. The results are shown in Fig.…”

Section: Resultsmentioning

confidence: 99%

Preparation of Ni-Doped Colloidal Silica Abrasives and Their Chemical Mechanical Polishing Performances on Sapphire

Lei

Chen

et al. 2016

ECS J. Solid State Sci. Technol.

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Chemical mechanical polishing (CMP) has become a widely accepted global planarization technology. Abrasive is one of the key elements in CMP process. In order to enhance material removal rate (MRR) and improve surface quality of sapphire substrate, a series of novel Ni-doped colloidal silica abrasives were prepared by seed-induced growth method. The CMP performances of composite abrasives on sapphire substrate were investigated using UNIPOL-1502 polishing equipment. The analyses on the surface of polished sapphire substrate indicate that slurries containing the Ni-doped colloidal silica composite abrasives achieve lower surface roughness and higher material removal rate than that of pure colloidal SiO 2 abrasive under the same experimental conditions. Furthermore, the acting mechanism of the Ni-doped colloidal silica abrasive on sapphire CMP was investigated. X-ray photoelectron spectroscopy analysis shows that solid-state chemical reactions between Ni-doped colloidal silica abrasive and sapphire surface occur during CMP process, which can promote the chemical effect in CMP and lead to the improvement of material removal rate.With the development of light emitting diodes (LEDs), substrate materials have been given more attention. Sapphire wafers with c (0001) orientation are used as lattice-mismatched substrate for gallium nitride (GaN) LED on account of its comparatively low cost, large diameter, high quality, chemical compatibility, optical transparency and high temperature stability etc. 1-5 It has been established that the crystal structure of epitaxial films is strongly influenced not only by the substrate material and its orientation, but to a great extent also by the surface preparation of the substrate. 6 The defects on the substrate surface could be replicated into the epilayer and impair the quality of epitaxy, 7 so the surface of sapphire is required to be super smooth and has little defect. As is known to all, the intrinsic nature of sapphire (great hardness and chemical inertness) poses great challenges to such machining. 8,9 To achieve the above-mentioned surface quality of sapphire, researchers put forward several polishing technologies. 10 Among which, chemical mechanical polishing (CMP) is almost only accepted global planarization technology for sapphire because of its simple operation, high processing efficiency and little or no surface and subsurface damage (such as scratch and microcrack). 11,12 In the CMP process, there are up to 16 variables that need to be controlled to achieve a stable process, and one of the major variables is related to slurry. 13 As the basic element of slurry, i.e. the hardness, size, and chemical properties of abrasives are crucial for a good CMP performance. 14 A series of inorganic abrasives were used to examine the sapphire CMP, such as silica, diamond, boron carbide, ceria and alumina. [15][16][17][18] And it is found that high material removal rate (MRR) and good surface quality is very difficult to be obtained at the same time. With limiting of production cost a...

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Application of ToF-SIMS surface analysis to tribochemistry in metal forming processes

Cited by 25 publications

References 20 publications

In Situ Study of Model Organic Friction Modifiers Using Liquid Cell AFM; Saturated and Mono-unsaturated Carboxylic Acids

In Situ Study of Model Organic Friction Modifiers Using Liquid Cell AFM; Saturated and Mono-unsaturated Carboxylic Acids

Time-of-Flight Secondary Ion Mass Spectroscopy investigation of the chemical rearrangement undergone by MoS2 under tribological conditions

Preparation of Ni-Doped Colloidal Silica Abrasives and Their Chemical Mechanical Polishing Performances on Sapphire

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