Application of Simulated Annealing to Multilayers Reverse Engineering.

Abstract

Knowledge and control of a technological process require efficient tools to have a good insight during and after deposit. In situ controls have many advantages because they provide a real time insight on the changes which occur in the deposit with a certain accuracy. However, the in situ measurement does not enable real time feedback on the technological parameters. We therefore developed techniques to characterize samples after deposition. We will show in this paper that the complementarity between optical and X-ray techniques can lead to very fine results. Our deposition chamber is provided with an original system which enables a sampling of some monolayers from the stack. The Investigation of these monolayers help to make a reverse engineering on stacks of several layers.