Application of Sigma7500 pattern generator to X architecture and 45-nm generation mask making

Yao, Ming-Jiun; Wang, Tzu-Yi; Chen, Chia-Jen; Lee, Hsin-Chang; Ku, Yao-Ching

doi:10.1117/12.728919

Cited by 7 publications

(3 citation statements)

References 13 publications

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“…MMAs are utilized nowadays within deep-UV mask writers as reflective, programmable photomasks for the projection of flexible patterns and enable a highly parallel writing of mask structures [2]. Further application fields are currently expected within wafer steppers as a programmable mask [3]- [4] or potentially within the excimer laser illumination path, which indicates a still increasing interest in micro-optoelectro-mechanical-systems (MOEMS) for microlithography.…”

Section: Introductionmentioning

confidence: 99%

Contrast properties of spatial light modulators for microlithography

et al. 2007

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The present article discusses steps for the realistic description of optical properties of micro-mirror arrays (MMA), which are utilized as programmable masks for microlithography. The article focuses on global contrast as an elementary example for the understanding of MMA's diffractive operation principle. Central point will be a discussion of those MEMS properties that influence the global MMA contrast, and how to introduce them into simulation. Surface corrugations of single mirrors and slit properties will be taken into account. Comparison is made with experimental contrast data to validate the theoretical assumptions

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Section: Introductionmentioning

confidence: 99%

Contrast properties of spatial light modulators for microlithography

et al. 2007

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“…It is against their nature to pattern a large number of pixels with many electrons together. Therefore, even though the electron horses 7 overpower the photon horses in writing mask patterns with single beam, multi-photon-beam (MPB) mask writing has proven to have higher throughput than single-electron-beam mask writing 13 . If the space charge effect of electrons is contained to allow multielectron-beam (MEB) operation, e-beam horses can be as productive as photon horses.…”

Section: Microlithography and Horsesmentioning

confidence: 99%

Marching of the microlithography horses: electron, ion, and photon: past, present, and future

Lin

2007

SPIE Proceedings

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Microlithography patterning employs one of three media; electron, ion, and photon. They are in a way like horses, racing towards the mainstream. Some horses such as electrons run fast but repel each other. Ion beams behave like electron beams but are less developed. The photon beam is the undisputed workhorse, taking microlithography from the 5-µm minimum feature size to 32-nm half pitch. This paper examines the history of microlithography in pattern generation, proximity printing, and projection printing, then identifies the strong and weak points of each technology. In addition to ion-beam and e-beam lithography, the coverage of optical lithography spans the wavelength from 436 to 13.5 nm. Our learning from history helps us prevent mistakes in the future. In almost all cases, making or using the mask presents one of the limiting problems, no matter the type of beams or the replication method. Only the maskless method relieves us from mask-related problems. A way to overcome the low throughput handicap of maskless systems is to use multiple e-beam direct writing, whose imaging lens can be economically and compactly fabricated using MEMS techniques.In a way, the history of microlithography parallels that of aviation. Proximity printing is like the Wright-Brothers' plane; 1X projection printing, single-engine propeller plane with unitized body; reduction step-and-repeat projection printing, multi-engine commercial airliner; scanners, jet airliners. Optical lithography has improved in many ways than just increasing NA and reducing wavelength just as the commercial airliners improving in many other areas than just the speed. The SST increased the speed of airliners by more than a factor of two just as optical resolution doubled with double exposures. EUV lithography with the wavelength reduced by an order of magnitude is similar to the space shuttle increasing its speed to more than 10 times that of the SST. Multiple-beam direct write systems are like helicopters. They do not need airports(masks) but we need a lot of beams to carry the same payload.Keywords: Microlithography, e-beam lithography, ion-beam lithography, optical lithography, x-ray lithography, EUV lithography, microlithography history, microlithography outlook IntroductionMicrolithography, a specific technology used to pattern IC circuits as early as 1958, is coming to its 50 th anniversary. Initially, it was as straightforward as ancient-day lithographers replicating patterns carved in stone masks. However, as circuit dimensions continued to shrink, more care had to be taken for microlithography. Very early on, people recognized that there was a limit to photon-based patterning techniques, higher energy particles or shorter wavelengths such as electrons and ions were proposed as the patterning carrier. "Optical techniques for fabricating devices are generally limited to > 5 µm linewidths in practical production by the diffraction effects", according to Herriot 1 in 1975. He must have in mind proximity printing at a large mask-to-wafer gap using near-uv...

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“…Micro-opto-electro-mechanical systems (MOEMS) have opened a prominent micro system application in the field of semiconductor fabrication since more than one decade. For example, diffractive micromirror arrays (MMAs) serve as reflective programmable photo masks projecting variable illumination patterns at frame rates in the kHz range in a novel generation of laser-mask-writers operating in the deep ultra-violet (DUV) ( [1], [2]). An essential feature of these MMAs is the grey scale modulation of DUV laser pulses to adjust pattern edges that derives from the continuous deflection capability of single mirrors.…”

Section: Introductionmentioning

confidence: 99%

Multispectral characterization of diffractive micromirror arrays

et al. 2010

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The present article discusses an optical concept for the characterization of diffractive micromirror arrays (MMAs) within an extended wavelength range from the deep ultra-violet up to near-infrared. The task derives from the development of a novel class of MMAs that will support programmable diffractive properties between 240 nm and 800 nm. The article illustrates aspects of the achromatic system design that comprises the reflective beam homogenization with divergence control and coherence management for an appropriate MMA illumination as well as the transfer of phase modulating MMA patterns into intensity profiles for contrast imaging. Contrast measurements and grey scale imaging demonstrate the operation of the characterization system and reflect the encouraging start of technology development for multispectral, diffractive MMAs

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Application of Sigma7500 pattern generator to X architecture and 45-nm generation mask making

Cited by 7 publications

References 13 publications

Contrast properties of spatial light modulators for microlithography

Contrast properties of spatial light modulators for microlithography

Marching of the microlithography horses: electron, ion, and photon: past, present, and future

Multispectral characterization of diffractive micromirror arrays

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