Application of Polymers to Photoresist Materials

Soyano, Akimasa

doi:10.1177/0307174x1203900513

Cited by 5 publications

(6 citation statements)

References 11 publications

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“…Polymer films are an important component of many current technologies . They find extensive use in the electronics industry as an integral part of the photolithographic process and device manufacture, , but they are also utilized to modify surfaces toward water and biointeractions, , as well as for sensing , and display purposes . Creating surface-tethered polymer films on surfaces can be facilitated through the inclusion of an end group on a polymer chain that can bind to a substrate, offering the ability to form bound films from a wide range of materials.…”

Section: Introductionmentioning

confidence: 99%

Growing Patterned, Cross-linked Nanoscale Polymer Films from Organic and Inorganic Surfaces Using Ring-Opening Metathesis Polymerization

Pattison

Spanu

Friz

et al. 2019

ACS Appl. Mater. Interfaces

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The ability to modify substrates with thin polymer films allows for the tailoring of surface properties, and through combination of patterning finds use in a large variety of applications such as electronics and lab-on-chip devices. Although many techniques can be used to afford polymer-modified surfaces such as surface-initiated polymerization or layer-by-layer methodologies, their stability in a wide range of environments as well as their ability to target specific chemistry are critical factors to enable their successful application. In this paper, we report a facile technique in creating nanoscale polymer thin films using solid-state continuous assembly of polymers via ring-opening metathesis polymerization (ssCAP ROMP ) directly from surfaces functionalized through silanization. Using a polymeric precursor that includes norbornene moieties, a highly dense cross-linked network of polymer can be grown in a bottom-up fashion to afford thin films from an olefin-terminated silanized planar surface. Such nanotechnology affords films retaining the desirable qualities of previously reported methods while, at the same time, being covalently bound to the substrate: they are virtually pinhole free and can be reinitiated multiple times. By combining this process with microcontact printing, patterned films can be created by either the patterned deposition of a catalyst or by controlling the surface silanization chemistry and placement of olefin-terminated and nonreactive silanes. Additionally, patterned ssCAP ROMP films were grown from SU-8 by selectively functionalizing the surface through masking and lift-off processes after the silanization step, thereby spatially controlling the surface-initiation, and subsequent polymer film formation. These patterned films expand the capabilities of the CAP ROMP process and offer advantages over other film formation techniques in processes where patterned substrates and modified but robust surface chemistries are utilized.

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Section: Introductionmentioning

confidence: 99%

Growing Patterned, Cross-linked Nanoscale Polymer Films from Organic and Inorganic Surfaces Using Ring-Opening Metathesis Polymerization

Pattison

Spanu

Friz

et al. 2019

ACS Appl. Mater. Interfaces

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“…In this way, at normal conditions, the dissolution of the polymer is blocked by the hydroxyl group of Novolac and DNQ interactions. However, after the photoillumination, indenecarboxylic acid is formed via ketenes [136] of the DNQ; as a result, the Novolac polymer becomes soluble [140].…”

Section: The Described System Is Called the Amplification Resinsmentioning

confidence: 99%

Polymers for Regenerative Medicine Structures Made via Multiphoton 3D Lithography

Merkininkaitė

Gailevičius

Šakirzanovas

et al. 2019

International Journal of Polymer Science

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Multiphoton 3D lithography is becoming a tool of choice in a wide variety of fields. Regenerative medicine is one of them. Its true 3D structuring capabilities beyond diffraction can be exploited to produce structures with diverse functionality. Furthermore, these objects can be produced from unique materials allowing expanded performance. Here, we review current trends in this research area. We pay particular attention to the interplay between the technology and materials used. Thus, we extensively discuss undergoing light-matter interactions and peculiarities of setups needed to induce it. Then, we continue with the most popular resins, photoinitiators, and general material functionalization, with emphasis on their potential usage in regenerative medicine. Furthermore, we provide extensive discussion of current advances in the field as well as prospects showing how the correct choice of the polymer can play a vital role in the structure’s functionality. Overall, this review highlights the interplay between the structure’s architecture and material choice when trying to achieve the maximum result in the field of regenerative medicine.

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“…Since the 1970s, polymer resins have been widely utilized in the semiconductor industry for patterning through photolithography. 1 In state-of-the-art image sensors, permanent resins are used in arrays of microlenses to optimize the path of light and increase its yield. 2 The variety of resin compositions, their tunable refractive indices, and shapes allow them to meet the high standards required in microelectronics manufacturing.…”

Section: ■ Introductionmentioning

confidence: 99%

Moisture Diffusion in PECVD a-SiO_xN_y:H and a-SiO_x:H Coated on Polymer Resins: A Neutron Reflectometry Study

Chevreux,

Letiche,

Vorobiev

et al. 2024

ACS Appl. Electron. Mater.

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The uptake of water of as-deposited thin films of SiO x N y and SiO x hard coatings on epoxy polymer resin by PECVD is studied by X-ray photoelectron spectroscopy (XPS) and ToF-SIMS. The absence of a chemical composition gradient at the dielectric-resin interface suggests a rough interface between the two materials. Upon storage in a cleanroom environment for 6 months (19 °C/40% RH), the uptake of water of the polymer resin layer was observed by XPS. Additionally, ToF-SIMS depth profiling revealed significant changes in the water content at the SiO x N yresin interface. We attribute these changes to the absorption of water diffusing through the dielectric-resin. Neutron reflectometry performed under a dry and D 2 O atmosphere confirms that D 2 O was nonreversibly absorbed in the SiO x N y -resin, but only limited moisture diffusion was observed in the SiO x -resin.

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Application of Polymers to Photoresist Materials

Cited by 5 publications

References 11 publications

Growing Patterned, Cross-linked Nanoscale Polymer Films from Organic and Inorganic Surfaces Using Ring-Opening Metathesis Polymerization

Growing Patterned, Cross-linked Nanoscale Polymer Films from Organic and Inorganic Surfaces Using Ring-Opening Metathesis Polymerization

Polymers for Regenerative Medicine Structures Made via Multiphoton 3D Lithography

Moisture Diffusion in PECVD a-SiO_xN_y:H and a-SiO_x:H Coated on Polymer Resins: A Neutron Reflectometry Study

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Application of Polymers to Photoresist Materials

Cited by 5 publications

References 11 publications

Growing Patterned, Cross-linked Nanoscale Polymer Films from Organic and Inorganic Surfaces Using Ring-Opening Metathesis Polymerization

Growing Patterned, Cross-linked Nanoscale Polymer Films from Organic and Inorganic Surfaces Using Ring-Opening Metathesis Polymerization

Polymers for Regenerative Medicine Structures Made via Multiphoton 3D Lithography

Moisture Diffusion in PECVD a-SiOxNy:H and a-SiOx:H Coated on Polymer Resins: A Neutron Reflectometry Study

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Product

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Moisture Diffusion in PECVD a-SiO_xN_y:H and a-SiO_x:H Coated on Polymer Resins: A Neutron Reflectometry Study