Application of Microplasma for $\hbox{NO}_{\rm x}$ Removal

Shimizu, Kazuo; Sugiyama, T.; Nishamani, L S Manisha; Kanamori, Masaki

doi:10.1109/tia.2009.2023494

Cited by 12 publications

(4 citation statements)

References 21 publications

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“…As previously mentioned, arrays of microplasmas would allow materials throughput to be drastically increased and enable large area deposition or modification of thin films. Microplasma arrays have been recently developed for applications in photonics [52], metamaterials [183], stealth technology/radar cloaking [184], medicine [185][186][187], environment [188,189] and lighting or display [190][191][192][193]. In the latter case, the technology is near the commercialization stage (http://www.edenpark.com).…”

Section: Microplasma Arraysmentioning

confidence: 99%

Microplasmas for nanomaterials synthesis

Mariotti¹,

Sankaran²

2010

J. Phys. D: Appl. Phys.

509

399

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Microplasmas have attracted a tremendous amount of interest from the plasma community because of their small physical size, stable operation at atmospheric pressure, non-thermal characteristics, high electron densities and non-Maxwellian electron energy distributions. These properties make microplasmas suitable for a wide range of materials applications, including the synthesis of nanomaterials. Research has shown that vapour-phase precursors can be injected into a microplasma to homogeneously nucleate nanoparticles in the gas phase. Alternatively, microplasmas have been used to evaporate solid electrodes and form metal or metal-oxide nanostructures of various composition and morphology. Microplasmas have also been coupled with liquids to directly reduce aqueous metal salts and produce colloidal dispersions of nanoparticles. This topical review discusses the unique features of microplasmas that make them advantageous for nanomaterials synthesis, gives an overview of the diverse approaches previously reported in the literature and looks ahead to the potential for scale-up of current microplasma-based processes.

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Section: Microplasma Arraysmentioning

confidence: 99%

Microplasmas for nanomaterials synthesis

Mariotti¹,

Sankaran²

2010

J. Phys. D: Appl. Phys.

509

399

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“…Despite of these negative consequences only a limited number of countries are imposing environmental regulations and taxes concerning NO x levels, a fact that is related to the unaffordable high costs for NO x removal technologies in most developing countries. For example, available technologies for NO x reduction include selective catalytic reduction, 2) selective non-catalytic reduction (SCR), 3,4) low-temperature oxidation (LTO) by ozone, [5][6][7][8] non-thermal plasma, [9][10][11][12][13][14][15][16][17][18][19][20][21][22][23][24][25][26] electron beam irradiation and several hybrid techniques. [27][28][29][30][31] However, despite of this variety, none of these methods is free of limitations concerning the implementation.…”

Section: Introductionmentioning

confidence: 99%

Investigation of NO_x Reduction by Low Temperature Oxidation Using Ozone Produced by Dielectric Barrier Discharge

Stamate

Irimiea

Salewski

2013

Jpn. J. Appl. Phys.

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NO x reduction by low temperature oxidation using ozone produced by a dielectric barrier discharge generator is investigated for different process parameters in a 6 m long reactor in serpentine arrangement using synthetic dry flue gas with NO x levels below 500 ppm, flows up to 50 slm and temperatures up to 80 °C. The role of different mixing schemes and the impact of a steep temperature gradient are also taken into consideration. The process chemistry is monitored by Fourier transform infrared spectroscopy, chemiluminescence and absorption spectroscopy. The kinetic mechanism during the mixing in a cross flow configuration is investigated using three-dimensional simulations.

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“…The surface oxides on the substrate are mechanically or chemically removed by the microplasma treatment. The simple system can be easily installed anywhere, 20,21) and microplasma has already been used to treat the surface of GaN. [22][23][24][25][26] The uniformity and reproducibility of the growth were reported to be greatly improved by atmospheric-pressure microplasma treatment before the growth.…”

Section: Introductionmentioning

confidence: 99%

Low-pressure N₂ microplasma treatment for substrate surface cleaning prior to GaN selective growth

Kusakabe

Sugiyama

Takenaka

et al. 2018

Jpn. J. Appl. Phys.

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Low-pressure microplasma treatment was performed to clean a substrate surface prior to the selective growth of GaN by chemical beam epitaxy. To investigate the cleaning mechanism, the process pressure and process time were systematically varied. The plasma distribution was also studied using a special sheet, whose color changes following the irradiation of plasma species. Consequently, it was found that the range of microplasma irradiation increased with decreasing process pressure, and simultaneously, the morphology of selective growth was improved. Secondary ion mass spectrometry measurements show that the oxygen concentration at the growth interface was reduced from 9.7 × 1014 to 2.6 × 1013 atoms/cm2 by the microplasma treatment. Otherwise, the surface oxides resulted in the growth of a rough surface with the suppression of the layer-by-layer growth.

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Application of Microplasma for $\hbox{NO}_{\rm x}$ Removal

Cited by 12 publications

References 21 publications

Microplasmas for nanomaterials synthesis

Microplasmas for nanomaterials synthesis

Investigation of NO_x Reduction by Low Temperature Oxidation Using Ozone Produced by Dielectric Barrier Discharge

Low-pressure N₂ microplasma treatment for substrate surface cleaning prior to GaN selective growth

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Application of Microplasma for $\hbox{NO}_{\rm x}$ Removal

Cited by 12 publications

References 21 publications

Microplasmas for nanomaterials synthesis

Microplasmas for nanomaterials synthesis

Investigation of NOx Reduction by Low Temperature Oxidation Using Ozone Produced by Dielectric Barrier Discharge

Low-pressure N2 microplasma treatment for substrate surface cleaning prior to GaN selective growth

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Product

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Investigation of NO_x Reduction by Low Temperature Oxidation Using Ozone Produced by Dielectric Barrier Discharge

Low-pressure N₂ microplasma treatment for substrate surface cleaning prior to GaN selective growth