2017
DOI: 10.1149/2.0041712jss
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Application of Flash Lamp Annealing on Nitrogen-Doped Amorphous Indium-Gallium-Zinc-Oxide Thin Film Transistors

Abstract: Amorphous nitrogenated indium-gallium-zinc oxide (a-IGZO:N) thin films were deposited on highly doped silicon (n+Si) wafer substrates and heat-treated by millisecond flash lamp annealing (FLA) at different preheating temperatures to enhance the electrical characteristics of oxynitride thin film transistors (TFTs). A one-dimensional conduction/radiation heat transfer simulation was conducted to predict the temperature fields in the Si substrate, which indicated that the film temperatures during FLA instantaneou… Show more

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Cited by 2 publications
(2 citation statements)
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“…It can be concluded that the nitrogen-related bonding state in the ZnON TFT has a great influence on the properties of the TFT device. Also, Nitrogenated a-IGZO (a-IGZO:N) thin film was deposited on SiO 2 /Si wafer using DC sputtering followed by an IPL annealing [24]. A preheating step using a plate-heater was conducted to improve the efficiency of the IPL annealing process.…”
Section: Vacuum Deposited Thin Filmsmentioning
confidence: 99%
See 1 more Smart Citation
“…It can be concluded that the nitrogen-related bonding state in the ZnON TFT has a great influence on the properties of the TFT device. Also, Nitrogenated a-IGZO (a-IGZO:N) thin film was deposited on SiO 2 /Si wafer using DC sputtering followed by an IPL annealing [24]. A preheating step using a plate-heater was conducted to improve the efficiency of the IPL annealing process.…”
Section: Vacuum Deposited Thin Filmsmentioning
confidence: 99%
“…The IPL post-treatment process has a variety of advantages. First, it can be applied to various types of functional materials such as metals [11][12][13][14][15][16][17][18], semiconductors [19][20][21][22][23][24], and dielectrics [25][26][27][28] due to wide wavelength characteristics. Each material has its own light absorption, followed by heat emission, characteristics depending on the wavelength.…”
Section: Introductionmentioning
confidence: 99%